JPS5935075A - Method of bonding ceramic and metal - Google Patents

Method of bonding ceramic and metal

Info

Publication number
JPS5935075A
JPS5935075A JP14532482A JP14532482A JPS5935075A JP S5935075 A JPS5935075 A JP S5935075A JP 14532482 A JP14532482 A JP 14532482A JP 14532482 A JP14532482 A JP 14532482A JP S5935075 A JPS5935075 A JP S5935075A
Authority
JP
Japan
Prior art keywords
metal
buffer
brazing
layer
gold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14532482A
Other languages
Japanese (ja)
Inventor
武利 村上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toto Ltd
Original Assignee
Toto Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toto Ltd filed Critical Toto Ltd
Priority to JP14532482A priority Critical patent/JPS5935075A/en
Publication of JPS5935075A publication Critical patent/JPS5935075A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明し」セラミックスと金属との接合、特に熱W張係
数の異なるセラミックスと金属との接合方法の改良に四
する。
DETAILED DESCRIPTION OF THE INVENTION The present invention aims to improve a method for bonding ceramics and metals, particularly ceramics and metals having different thermal tensile coefficients.

従来、セラミックス(例えばアルミナンと、金属とをろ
う接する場合にけコバール金属を選択して接合している
。その理由としてはセラミックスと熱膨張係数力(異な
る他の金属を使用すると熱膨張係数の差によシセヲミッ
クスと金属との界面に応力が残ジメタライズ面からの金
属のH画成いはセラミックス自体に割れを生じる為セラ
ミックスと熱膨張係数が近似するコバール金属等を使用
している。
Conventionally, when ceramics (for example, aluminan) and metal are to be soldered, Kovar metal is selected and joined. If stress remains at the interface between the metallized surface and the metallized surface, the H-shape of the metal from the metallized surface will cause cracks in the ceramic itself, so a metal such as Kovar, which has a coefficient of thermal expansion similar to that of the ceramic, is used.

処が、このコバール金属は耐熱性、耐蝕性に劣る為、極
めて用途範囲が狭い不具合がある。
However, this Kovar metal has poor heat resistance and corrosion resistance, so it has an extremely narrow range of applications.

本発明tよ上記従来事情に鑑みてなされたもので、その
目的とする処は、耐熱性、耐蝕性に優れコスト的にも安
価なステンレス鋼等の所望の金属を、セラミックスに何
も弊害本なく接合できるセラミックスと金属との接合方
法を提供せんとするものである。
The present invention has been made in view of the above-mentioned conventional circumstances, and its purpose is to use a desired metal such as stainless steel, which has excellent heat resistance and corrosion resistance and is inexpensive in cost, to ceramics without causing any harmful effects. The purpose of this invention is to provide a method for joining ceramics and metals that can be joined without any problems.

以下、本発明の実施の態様を図面に基づいて朋。Hereinafter, embodiments of the present invention will be explained based on the drawings.

明する。I will clarify.

第1工程は、セラミックス、例えにアルミナ基板体)ニ
、タングステン−モリブデン、モリブデン−マンガン或
いLタングステン単味のペーストを印刷し、加湿還元雰
囲気中にて1400〜1600℃で焼付叶てアルミナ基
板に)表面にメタライジング層(1)を形成し、更にニ
ツナルメッギ層(4)を軸層する。
The first step is to print a paste of ceramic (for example, alumina substrate), tungsten-molybdenum, molybdenum-manganese, or L tungsten, and bake it at 1400-1600℃ in a humidified reducing atmosphere to form an alumina substrate. 2) A metallizing layer (1) is formed on the surface, and a Nitsunalmeggi layer (4) is further applied as an axis layer.

次に第21ニ程としてそのニッケルメッキ層(4)に緩
術金R(2)をろう付会属(3a)を介してろう付けす
る。
Next, in the 21st step, the nickel-plated layer (4) is brazed with a slow-moving gold R (2) via a brazing member (3a).

緩衝金属(2)は、ステンレス板、ニッケル板等の金属
板の薄板(肉厚Q、95m)を熔融温度約960℃の銀
ろう(3a)’を介して前記ニッケルメッキ層(4)に
接合する。
The buffer metal (2) is a thin metal plate (thickness Q, 95 m) such as a stainless steel plate or a nickel plate, which is bonded to the nickel plating layer (4) via a silver solder (3a)' having a melting temperature of about 960°C. do.

この時ろう付は時の熱によシアルミナ基板(A)及び緩
衝金M(2)は熱膨張係数(セラミックス、75〜85
X10−’/℃1.x、fンレス110−185X10
−7/℃)の差によシその界面に残留応力が生ずるも、
緩衝金8 (2)の容易なる弾性変形にょシ緩和され、
メタライジングM(す、アルミナ基板(ト)には伝達さ
れず、メタライジング層(υからの剥離、アルます基板
の割れを阻止する。
At this time, the brazing is performed due to the heat of the sialumina substrate (A) and the buffer gold M (2), which have a thermal expansion coefficient (ceramics, 75 to 85).
X10-'/℃1. x, fless 110-185X10
Although residual stress is generated at the interface due to the difference in temperature (-7/℃),
The easy elastic deformation of buffer metal 8 (2) is alleviated,
It is not transmitted to the metallized M (S) and alumina substrate (G), and prevents peeling from the metallized layer (υ) and cracking of the alumina substrate.

この状態で目的とする金Mの)、例えばステンレス(1
3)を接合する準備工程は終了し、後の工程として低融
点のろう付金#I(3′h)(銀、百合全系)を介して
ニッケルメッキ層(4)を麹層した目的とする金F4の
)を接合すれば良い。(第8工程)ちなみに、第8工程
におりて、緩衝金N(2)と、目的とする金属(B)と
の熱膨張係数が同一である場合は問題ないが、熱膨張係
数が異なるとその差によシ界面に残留応力が生じるも両
全M (2) (B)が弾性変形して緩和する為、剥離
する心配はない。
In this state, the target gold M), for example, stainless steel (1
The preparation process for joining 3) has been completed, and as a subsequent process, a nickel plating layer (4) is coated with a koji layer via a low melting point brazing metal #I (3'h) (silver, lily-based). It is sufficient to join the gold F4). (8th step) By the way, in the 8th step, there is no problem if the thermal expansion coefficients of the buffer gold N (2) and the target metal (B) are the same, but if the thermal expansion coefficients are different, then Although residual stress is generated at the interface due to this difference, both M (2) and (B) are elastically deformed and relaxed, so there is no risk of peeling.

尚、緩衝金属(2)は、アルミナ基板(A)との界面に
発生する残留応力に対して弾性変形するものでを)れは
パンチングメタルであっても網状、#i維状に細組した
ものでも勿論任意である。
Note that the buffer metal (2) is one that elastically deforms in response to residual stress generated at the interface with the alumina substrate (A). Even if it is a punched metal, it is finely assembled into a net shape or #i fiber shape. Of course, it is arbitrary.

ちなみに上述の工程をもって金属を接合したセラミック
板を800℃から室温迄の急冷加熱サイクルを数十回繰
返光しても接合部分には何らの異常も見うけられないこ
とが実験によシ立証された。
By the way, it has been experimentally proven that even if ceramic plates bonded with metal using the process described above are subjected to rapid cooling and heating cycles from 800℃ to room temperature several dozen times, no abnormalities will be observed in the bonded areas. It was done.

尚、メタライジング層(1)、ニッケルメッキ層(4)
を旋層したアルミナ基板に)に、ニッケルメッキ層(4
)を#iMした目的とする金Mの)であるステンレス(
IH)を直接ろう付会属(3ル)を介して接合したセラ
ミック板を形成した場合にはアルミナ基板内とステンレ
ス(IB)との界面に熱膨張係数の差による発生ずる残
留応力が直接アルミナ基板(A)に作用しアルミナ基板
(A)の割れを生じ、緩衝金属(2)を介するも゛rア
ルミナ基板)と、緩衝金R(2)、綬衝金M(2)と目
的とする金J−4(B)とを同時ろう伺けしt(−場合
には、夫々の界面に熱膨張係数の差により発生ずる残留
応力がメタライジング層0)に作用17、メタ)イジン
グ層0)の剥離を招くことが実験により証明された。
In addition, metallizing layer (1), nickel plating layer (4)
on a laminated alumina substrate), a nickel plating layer (4
) of stainless steel (
When a ceramic plate is formed by directly joining IH (IH) through brazing (3), the residual stress generated due to the difference in thermal expansion coefficient at the interface between the alumina substrate and the stainless steel (IB) is directly applied to the alumina. It acts on the substrate (A), causing a crack in the alumina substrate (A), and the buffer metal (2) is then passed through the buffer metal (2) to form the alumina substrate), the buffer metal R (2), and the ribbon metal M (2). Gold J-4 (B) is simultaneously soldered (in the case of -, residual stress generated at the respective interfaces due to the difference in coefficient of thermal expansion acts on the metallizing layer 0). Experiments have shown that this can lead to peeling.

してみれば、[゛γアルミナ基板)と、目的とする金M
 (n)との間には緩衝金N(2)を介在させなければ
ならないこと、J [アルミナ基板(A)に緩衝金#I
(2)をろう付けする工程と、緩衝金属(2)に目的と
する金ハω)をろう付けする工程は、別J:稈でなけれ
ばならないこと、」 [緩衝金8(2)に目的とする金
属(13)をろう付けする金属は、アルミナ基板(イ)
)に&ll金金属2)をろう伺け゛する金↓M K J
j: t、て低融点でなけれげなら力いこと、」が理論
的に1’sY明される。
Then, [゛γ alumina substrate] and the target gold M
(n), a buffer gold N (2) must be interposed between the buffer gold #I and the alumina substrate (A).
The process of brazing the buffer metal (2) and the process of brazing the target gold ω) to the buffer metal (2) must be separate J: culm. The metal to which the metal (13) is brazed is the alumina substrate (a)
) to &ll gold metal 2) ↓ M K J
Theoretically, 1'sY is clear that t is very strong unless it has a low melting point.

本発明tJ、叙上の如くセラミ;・クスにメタライジン
グJ−る第i]二paと、そのメタライジング層にろう
伺は金パを介して緩衝全問を積層−lるぎλ2工程と、
その緩衝金属に」二記ろう伺り金によシも低融点のろう
付会属を介して目的とする金属をろう付けする第8工程
を備えているので、第2工程においてセラミックスに緩
衝金属をろう付けした際ろう付会属の発熱によ)アルミ
ナ基板及び緩衝金へのその界面には熱膨張係数の差によ
シ応力が生じるも緩衝金属の容易ガる弾性変形によシ緩
和され、セラミックスへは伝達されず目的とする金属を
接合できる素地を形成する。
In the present invention, as described above, metallizing is performed on the ceramic layer, and the metallizing layer is laminated with a buffer layer through the gold layer. ,
The second step is to braze the target metal to the buffer metal using a low melting point brazing metal. When brazing, stress is generated at the interface between the alumina substrate and the buffer metal (due to the heat generated by the brazing material) due to the difference in coefficient of thermal expansion, but this stress is alleviated by the elastic deformation of the buffer metal, which easily breaks. , it is not transmitted to ceramics and forms a base to which the desired metal can be bonded.

それ故、その緩衝金属に低融点のろう付金4を介して目
的とする金属を接合すれば何なくセラミックスに目的と
する金属を接合でき、仁の工程において界面に生じる熱
膨張係数の差による応力は、その緩衝金属、目的とする
金属にて緩和されてメタライジング層、セラミックスへ
は伝達されずメタライジング層の剥離、セラミックスの
割れは生じない。
Therefore, if the desired metal is bonded to the buffer metal via the low melting point brazing metal 4, the desired metal can be bonded to the ceramic without any problem. The stress is relaxed by the buffer metal and the target metal, and is not transmitted to the metallizing layer or ceramics, so that peeling of the metallizing layer or cracking of the ceramics does not occur.

Claims (1)

【特許請求の範囲】[Claims] セラミックスにメタライジングする第1工程と、そのメ
タライジング層にろう伺は金属を介l〜で緩衝金属を積
層する第2工程と、その緩衝金属に上記ろう(−jkJ
金言よりも低融点のろう付は金属を介し7て目的とする
金P4をろう付けする第8]:稈とからなるセラミック
スと金属との接合方法1、
The first step is metallizing the ceramic, the second step is laminating the buffer metal on the metallized layer with the metal intervening, and the buffer metal is laminated with the above wax (-jkJ).
Brazing with a lower melting point than the golden rule brazing the target gold P4 through the metal 7]: Method for joining metal and ceramics consisting of culm 1,
JP14532482A 1982-08-20 1982-08-20 Method of bonding ceramic and metal Pending JPS5935075A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14532482A JPS5935075A (en) 1982-08-20 1982-08-20 Method of bonding ceramic and metal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14532482A JPS5935075A (en) 1982-08-20 1982-08-20 Method of bonding ceramic and metal

Publications (1)

Publication Number Publication Date
JPS5935075A true JPS5935075A (en) 1984-02-25

Family

ID=15382522

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14532482A Pending JPS5935075A (en) 1982-08-20 1982-08-20 Method of bonding ceramic and metal

Country Status (1)

Country Link
JP (1) JPS5935075A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60246276A (en) * 1984-05-18 1985-12-05 株式会社日立製作所 Composite body of ceramic and metal
US4746054A (en) * 1985-08-29 1988-05-24 Northrop Corporation Method of joining concentric cylinders
US4890783A (en) * 1988-11-29 1990-01-02 Li Chou H Ceramic-metal joining
WO1990006208A1 (en) * 1988-11-29 1990-06-14 Li Chou H Materials joining
JPH03261670A (en) * 1990-03-12 1991-11-21 Eagle Ind Co Ltd Joined product of metal with ceramics and method for joining the same

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60246276A (en) * 1984-05-18 1985-12-05 株式会社日立製作所 Composite body of ceramic and metal
JPH0223501B2 (en) * 1984-05-18 1990-05-24 Hitachi Ltd
US4746054A (en) * 1985-08-29 1988-05-24 Northrop Corporation Method of joining concentric cylinders
US4890783A (en) * 1988-11-29 1990-01-02 Li Chou H Ceramic-metal joining
WO1990006208A1 (en) * 1988-11-29 1990-06-14 Li Chou H Materials joining
JPH03261670A (en) * 1990-03-12 1991-11-21 Eagle Ind Co Ltd Joined product of metal with ceramics and method for joining the same

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