JPS62139300A - シンクロトロン放射光取出し方法およびその方法を用いる電子波動リング - Google Patents

シンクロトロン放射光取出し方法およびその方法を用いる電子波動リング

Info

Publication number
JPS62139300A
JPS62139300A JP27990585A JP27990585A JPS62139300A JP S62139300 A JPS62139300 A JP S62139300A JP 27990585 A JP27990585 A JP 27990585A JP 27990585 A JP27990585 A JP 27990585A JP S62139300 A JPS62139300 A JP S62139300A
Authority
JP
Japan
Prior art keywords
electron
electrons
predetermined number
wave
synchrotron radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27990585A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0514400B2 (enrdf_load_stackoverflow
Inventor
冨増　多喜夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP27990585A priority Critical patent/JPS62139300A/ja
Priority to DE19863642400 priority patent/DE3642400A1/de
Publication of JPS62139300A publication Critical patent/JPS62139300A/ja
Publication of JPH0514400B2 publication Critical patent/JPH0514400B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/04—Magnet systems, e.g. undulators, wigglers; Energisation thereof
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/06—Two-beam arrangements; Multi-beam arrangements storage rings; Electron rings

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Particle Accelerators (AREA)
JP27990585A 1985-12-12 1985-12-12 シンクロトロン放射光取出し方法およびその方法を用いる電子波動リング Granted JPS62139300A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP27990585A JPS62139300A (ja) 1985-12-12 1985-12-12 シンクロトロン放射光取出し方法およびその方法を用いる電子波動リング
DE19863642400 DE3642400A1 (de) 1985-12-12 1986-12-11 Verfahren zur ableitung von synchrotronstrahlung und elektronen-wellungs-ring fuer die ableitung der synchrotronstrahlung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27990585A JPS62139300A (ja) 1985-12-12 1985-12-12 シンクロトロン放射光取出し方法およびその方法を用いる電子波動リング

Publications (2)

Publication Number Publication Date
JPS62139300A true JPS62139300A (ja) 1987-06-22
JPH0514400B2 JPH0514400B2 (enrdf_load_stackoverflow) 1993-02-24

Family

ID=17617549

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27990585A Granted JPS62139300A (ja) 1985-12-12 1985-12-12 シンクロトロン放射光取出し方法およびその方法を用いる電子波動リング

Country Status (2)

Country Link
JP (1) JPS62139300A (enrdf_load_stackoverflow)
DE (1) DE3642400A1 (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01195700A (ja) * 1988-01-29 1989-08-07 Agency Of Ind Science & Technol Ｘ線発生装置
JPH0294299A (ja) * 1988-09-28 1990-04-05 Mitsubishi Electric Corp シンクロトロン放射光発生装置
WO2014128848A1 (ja) * 2013-02-20 2014-08-28 株式会社日立製作所 有機薄膜パターン形成装置および形成方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2893767B2 (ja) * 1989-11-30 1999-05-24 株式会社島津製作所 荷電粒子集束装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01195700A (ja) * 1988-01-29 1989-08-07 Agency Of Ind Science & Technol Ｘ線発生装置
JPH0294299A (ja) * 1988-09-28 1990-04-05 Mitsubishi Electric Corp シンクロトロン放射光発生装置
WO2014128848A1 (ja) * 2013-02-20 2014-08-28 株式会社日立製作所 有機薄膜パターン形成装置および形成方法
JPWO2014128848A1 (ja) * 2013-02-20 2017-02-02 株式会社日立製作所 有機薄膜パターン形成装置および形成方法

Also Published As

Publication number Publication date
DE3642400A1 (de) 1987-07-02
JPH0514400B2 (enrdf_load_stackoverflow) 1993-02-24

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term