JPS621246B2 - - Google Patents
Info
- Publication number
- JPS621246B2 JPS621246B2 JP53129070A JP12907078A JPS621246B2 JP S621246 B2 JPS621246 B2 JP S621246B2 JP 53129070 A JP53129070 A JP 53129070A JP 12907078 A JP12907078 A JP 12907078A JP S621246 B2 JPS621246 B2 JP S621246B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- resist
- resist pattern
- electron beam
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12907078A JPS5556629A (en) | 1978-10-21 | 1978-10-21 | Pattern forming method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12907078A JPS5556629A (en) | 1978-10-21 | 1978-10-21 | Pattern forming method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5556629A JPS5556629A (en) | 1980-04-25 |
| JPS621246B2 true JPS621246B2 (show.php) | 1987-01-12 |
Family
ID=15000328
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12907078A Granted JPS5556629A (en) | 1978-10-21 | 1978-10-21 | Pattern forming method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5556629A (show.php) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5839015A (ja) * | 1981-09-01 | 1983-03-07 | Pioneer Electronic Corp | 半導体装置の製造方法 |
| US4520269A (en) * | 1982-11-03 | 1985-05-28 | International Business Machines Corporation | Electron beam lithography proximity correction method |
| US4717644A (en) * | 1982-12-20 | 1988-01-05 | International Business Machines Corporation | Hybrid electron beam and optical lithography method |
| US4610948A (en) * | 1984-01-25 | 1986-09-09 | The United States Of America As Represented By The Secretary Of The Army | Electron beam peripheral patterning of integrated circuits |
| JP4533931B2 (ja) * | 2005-06-03 | 2010-09-01 | 株式会社アドバンテスト | パターニング方法 |
-
1978
- 1978-10-21 JP JP12907078A patent/JPS5556629A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5556629A (en) | 1980-04-25 |
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