JPS6210687B2 - - Google Patents
Info
- Publication number
- JPS6210687B2 JPS6210687B2 JP15260179A JP15260179A JPS6210687B2 JP S6210687 B2 JPS6210687 B2 JP S6210687B2 JP 15260179 A JP15260179 A JP 15260179A JP 15260179 A JP15260179 A JP 15260179A JP S6210687 B2 JPS6210687 B2 JP S6210687B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- etching
- electrodes
- plasma
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15260179A JPS5676242A (en) | 1979-11-26 | 1979-11-26 | Treating apparatus using gas plasma reaction |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15260179A JPS5676242A (en) | 1979-11-26 | 1979-11-26 | Treating apparatus using gas plasma reaction |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5676242A JPS5676242A (en) | 1981-06-23 |
| JPS6210687B2 true JPS6210687B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-03-07 |
Family
ID=15543973
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15260179A Granted JPS5676242A (en) | 1979-11-26 | 1979-11-26 | Treating apparatus using gas plasma reaction |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5676242A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5852325B2 (ja) * | 1979-12-14 | 1983-11-22 | 富士通株式会社 | プラズマエッチング処理方法および処理装置 |
| JPS5858147A (ja) * | 1981-09-30 | 1983-04-06 | Shimadzu Corp | プラズマ処理装置 |
| JPS59139627A (ja) * | 1983-01-31 | 1984-08-10 | Hitachi Ltd | ドライエツチング装置 |
| JPS59189934A (ja) * | 1983-04-13 | 1984-10-27 | Nippon Telegr & Teleph Corp <Ntt> | 非晶質薄膜形成法及びそれに用いる装置 |
| JPS61267325A (ja) * | 1985-05-22 | 1986-11-26 | Tokyo Denshi Kagaku Kk | 有機膜の除去方法 |
| US5209803A (en) * | 1988-08-30 | 1993-05-11 | Matrix Integrated Systems, Inc. | Parallel plate reactor and method of use |
| JP3353514B2 (ja) * | 1994-12-09 | 2002-12-03 | ソニー株式会社 | プラズマ処理装置、プラズマ処理方法及び半導体装置の作製方法 |
| US7556740B2 (en) | 2002-08-27 | 2009-07-07 | Kyocera Corporation | Method for producing a solar cell |
| US7556741B2 (en) | 2002-08-28 | 2009-07-07 | Kyocera Corporation | Method for producing a solar cell |
| JP5382125B2 (ja) * | 2010-07-21 | 2014-01-08 | トヨタ自動車株式会社 | エッチング装置 |
| US8802545B2 (en) * | 2011-03-14 | 2014-08-12 | Plasma-Therm Llc | Method and apparatus for plasma dicing a semi-conductor wafer |
| CN104071747B (zh) * | 2014-07-14 | 2016-07-06 | 大连理工大学 | 一种等离子体甲烷重整制备合成气的方法 |
| JP2025052754A (ja) * | 2023-09-25 | 2025-04-07 | 東京エレクトロン株式会社 | プラズマ処理装置 |
-
1979
- 1979-11-26 JP JP15260179A patent/JPS5676242A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5676242A (en) | 1981-06-23 |