JPS62104440U - - Google Patents
Info
- Publication number
- JPS62104440U JPS62104440U JP13648185U JP13648185U JPS62104440U JP S62104440 U JPS62104440 U JP S62104440U JP 13648185 U JP13648185 U JP 13648185U JP 13648185 U JP13648185 U JP 13648185U JP S62104440 U JPS62104440 U JP S62104440U
- Authority
- JP
- Japan
- Prior art keywords
- pattern surface
- pattern
- light source
- reticle mask
- chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985136481U JPH0322904Y2 (enrdf_load_stackoverflow) | 1985-09-06 | 1985-09-06 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985136481U JPH0322904Y2 (enrdf_load_stackoverflow) | 1985-09-06 | 1985-09-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62104440U true JPS62104440U (enrdf_load_stackoverflow) | 1987-07-03 |
| JPH0322904Y2 JPH0322904Y2 (enrdf_load_stackoverflow) | 1991-05-20 |
Family
ID=31039635
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985136481U Expired JPH0322904Y2 (enrdf_load_stackoverflow) | 1985-09-06 | 1985-09-06 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0322904Y2 (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6461733A (en) * | 1987-09-01 | 1989-03-08 | Mitsubishi Electric Corp | Manufacture of matrix type display device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55132039A (en) * | 1979-04-02 | 1980-10-14 | Mitsubishi Electric Corp | Forming method for repeated figure |
| JPS55140838A (en) * | 1979-04-23 | 1980-11-04 | Hitachi Ltd | Mask preparing apparatus |
| JPS55165629A (en) * | 1979-06-11 | 1980-12-24 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
| JPS58419U (ja) * | 1981-06-25 | 1983-01-05 | 富士通株式会社 | レチクル |
-
1985
- 1985-09-06 JP JP1985136481U patent/JPH0322904Y2/ja not_active Expired
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55132039A (en) * | 1979-04-02 | 1980-10-14 | Mitsubishi Electric Corp | Forming method for repeated figure |
| JPS55140838A (en) * | 1979-04-23 | 1980-11-04 | Hitachi Ltd | Mask preparing apparatus |
| JPS55165629A (en) * | 1979-06-11 | 1980-12-24 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
| JPS58419U (ja) * | 1981-06-25 | 1983-01-05 | 富士通株式会社 | レチクル |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6461733A (en) * | 1987-09-01 | 1989-03-08 | Mitsubishi Electric Corp | Manufacture of matrix type display device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0322904Y2 (enrdf_load_stackoverflow) | 1991-05-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR970060356A (ko) | 패턴형성방법, 투영노출장치 및 반도체장치의 제조방법 | |
| DE2963537D1 (en) | Optical lithographic method and apparatus for copying a pattern onto a semiconductor wafer | |
| GB1461685A (en) | Method and means for forming an aligned mask that does not include alignment marks employed in aligning the mask | |
| US4841341A (en) | Integrator for an exposure apparatus or the like | |
| JPS58200238A (ja) | フオトマスク | |
| JPS62104440U (enrdf_load_stackoverflow) | ||
| JPS5493974A (en) | Projection-system mask alignment unit | |
| JPS5971342U (ja) | 光量調整装置 | |
| GB9515230D0 (en) | Method of manufacturing a photo mask for manufacturing a semiconductor device | |
| JPS5845533U (ja) | 照度分布測定装置 | |
| JPS59923A (ja) | 投影型露光装置 | |
| KR850002692A (ko) | X-선 노광 방법 및 장치 | |
| JPS55135837A (en) | Manufacture of photomask | |
| JPS63163855A (ja) | フオトリソグラフイ用マスク | |
| JPS62294202A (ja) | インテグレ−タ−およびそれを用いた露光装置 | |
| JPH01160828U (enrdf_load_stackoverflow) | ||
| JPS6157519U (enrdf_load_stackoverflow) | ||
| JPH01160829U (enrdf_load_stackoverflow) | ||
| JPH03117829U (enrdf_load_stackoverflow) | ||
| JPH09288345A (ja) | 投影プリント用マスク | |
| JPS6382933U (enrdf_load_stackoverflow) | ||
| JPS63188938U (enrdf_load_stackoverflow) | ||
| JPS5860743A (ja) | 転写用マスク | |
| JPS614955U (ja) | 縮小投影露光装置 | |
| JPH0370308A (ja) | 弾性表面波デバイス用マスクパターン |