JPS62103377A - Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法 - Google Patents

Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Info

Publication number
JPS62103377A
JPS62103377A JP24366085A JP24366085A JPS62103377A JP S62103377 A JPS62103377 A JP S62103377A JP 24366085 A JP24366085 A JP 24366085A JP 24366085 A JP24366085 A JP 24366085A JP S62103377 A JPS62103377 A JP S62103377A
Authority
JP
Japan
Prior art keywords
vacuum chamber
lid
dry etching
cvd
anodic oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24366085A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0553870B2 (show.php
Inventor
Yutaka Kato
豊 加藤
Eizo Isoyama
礒山　永三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Altemira Co Ltd
Original Assignee
Showa Aluminum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Aluminum Corp filed Critical Showa Aluminum Corp
Priority to JP24366085A priority Critical patent/JPS62103377A/ja
Publication of JPS62103377A publication Critical patent/JPS62103377A/ja
Publication of JPH0553870B2 publication Critical patent/JPH0553870B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP24366085A 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法 Granted JPS62103377A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24366085A JPS62103377A (ja) 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24366085A JPS62103377A (ja) 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Publications (2)

Publication Number Publication Date
JPS62103377A true JPS62103377A (ja) 1987-05-13
JPH0553870B2 JPH0553870B2 (show.php) 1993-08-11

Family

ID=17107108

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24366085A Granted JPS62103377A (ja) 1985-10-29 1985-10-29 Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法

Country Status (1)

Country Link
JP (1) JPS62103377A (show.php)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6686053B2 (en) 2001-07-25 2004-02-03 Kabushiki Kaisha Kobe Seiko Sho AL alloy member having excellent corrosion resistance
WO2006123736A1 (ja) * 2005-05-18 2006-11-23 Ulvac, Inc. アルミニウム又はアルミニウム合金の耐食処理方法
US8124240B2 (en) 2005-06-17 2012-02-28 Tohoku University Protective film structure of metal member, metal component employing protective film structure, and equipment for producing semiconductor or flat-plate display employing protective film structure
US8206833B2 (en) 2005-06-17 2012-06-26 Tohoku University Metal oxide film, laminate, metal member and process for producing the same

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4174888B2 (ja) * 1998-12-24 2008-11-05 アイシン精機株式会社 アルマイト皮膜
JP4796464B2 (ja) 2005-11-17 2011-10-19 株式会社神戸製鋼所 耐食性に優れたアルミニウム合金部材

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5752423A (en) * 1980-09-13 1982-03-27 Yukio Ishikawa High speed steam hot-water heater
JPS6021382A (ja) * 1983-07-15 1985-02-02 Canon Inc プラズマｃｖｄ装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5752423A (en) * 1980-09-13 1982-03-27 Yukio Ishikawa High speed steam hot-water heater
JPS6021382A (ja) * 1983-07-15 1985-02-02 Canon Inc プラズマｃｖｄ装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6686053B2 (en) 2001-07-25 2004-02-03 Kabushiki Kaisha Kobe Seiko Sho AL alloy member having excellent corrosion resistance
WO2006123736A1 (ja) * 2005-05-18 2006-11-23 Ulvac, Inc. アルミニウム又はアルミニウム合金の耐食処理方法
JP2006322040A (ja) * 2005-05-18 2006-11-30 Ulvac Japan Ltd アルミニウム又はアルミニウム合金の耐食処理方法
KR100935964B1 (ko) * 2005-05-18 2010-01-08 가부시키가이샤 알박 알루미늄 또는 알루미늄합금의 내식처리방법
US8124240B2 (en) 2005-06-17 2012-02-28 Tohoku University Protective film structure of metal member, metal component employing protective film structure, and equipment for producing semiconductor or flat-plate display employing protective film structure
US8206833B2 (en) 2005-06-17 2012-06-26 Tohoku University Metal oxide film, laminate, metal member and process for producing the same
US9476137B2 (en) 2005-06-17 2016-10-25 Tohoku University Metal oxide film, laminate, metal member and process for producing the same

Also Published As

Publication number Publication date
JPH0553870B2 (show.php) 1993-08-11

Similar Documents

Publication Publication Date Title
US5039388A (en) Plasma forming electrode and method of using the same
CN101031674B (zh) 铝或铝合金的耐腐蚀处理方法
KR20120021616A (ko) 금속 모재의 표면 처리 방법
TW201416494A (zh) 鋁合金的表面處理方法及鋁製品
CN103060881B (zh) 钛合金表面黑色抗高温氧化涂层制备方法
CN105239133A (zh) 一种钛及钛合金表面阳极氧化着色方法
JPH06192887A (ja) 高温で使用される金属部品のための保護被覆
JPS62103377A (ja) Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法
WO2019114060A1 (zh) 电极板及其表面处理方法
JP3506827B2 (ja) 表面処理アルミニウム材及びその製造方法
JP3152960B2 (ja) 真空機器用アルミニウム又はアルミニウム合金材の製造法
KR101819918B1 (ko) 고속 플라즈마 전해산화 공정
CN117954230B (zh) 一种中高压复合化成箔的制备方法及其应用
US1289215A (en) Process of printing on metal.
JP3705898B2 (ja) 真空機器の表面処理アルミニウム構成部品及びその製造方法
JPH01312088A (ja) ドライエッチング装置およびｃｖｄ装置用電極の製造方法
JP2009228132A (ja) 半導体製造装置用表面処理部材、および、その製造方法
JPH0372098A (ja) 真空用アルミニウム材の製造方法
US3282807A (en) Process for purifying electrode surfaces
JP2008240024A (ja) 複合体およびその製造方法
JPH09302499A (ja) アルミニウム材
JPH0499282A (ja) 高周波プラズマ発生用電極
WO2024214430A1 (ja) 表面処理アルミニウム材、その製造方法及び半導体処理装置用部材
JPS62101019A (ja) 半導体製造装置用シユラウドの製造方法
RU2830566C1 (ru) Защитное покрытие для титановых пластин и способ его нанесения