JPS62102854A - 回転処理装置 - Google Patents
回転処理装置Info
- Publication number
- JPS62102854A JPS62102854A JP24067385A JP24067385A JPS62102854A JP S62102854 A JPS62102854 A JP S62102854A JP 24067385 A JP24067385 A JP 24067385A JP 24067385 A JP24067385 A JP 24067385A JP S62102854 A JPS62102854 A JP S62102854A
- Authority
- JP
- Japan
- Prior art keywords
- cup
- wind speed
- speed sensor
- exhaust
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title description 3
- 238000001514 detection method Methods 0.000 claims description 3
- 238000003672 processing method Methods 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 abstract description 6
- 238000000576 coating method Methods 0.000 abstract description 6
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 4
- 230000007423 decrease Effects 0.000 abstract description 3
- 230000003247 decreasing effect Effects 0.000 abstract description 2
- 239000011521 glass Substances 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 241000276425 Xiphophorus maculatus Species 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 21
- 238000010438 heat treatment Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 206010037660 Pyrexia Diseases 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24067385A JPS62102854A (ja) | 1985-10-29 | 1985-10-29 | 回転処理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24067385A JPS62102854A (ja) | 1985-10-29 | 1985-10-29 | 回転処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62102854A true JPS62102854A (ja) | 1987-05-13 |
JPH0472590B2 JPH0472590B2 (enrdf_load_stackoverflow) | 1992-11-18 |
Family
ID=17062999
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24067385A Granted JPS62102854A (ja) | 1985-10-29 | 1985-10-29 | 回転処理装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62102854A (enrdf_load_stackoverflow) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63313160A (ja) * | 1987-06-16 | 1988-12-21 | Dainippon Printing Co Ltd | フォトマスク用基板等へのレジスト塗布方法およびスピンナチャック装置 |
JPH0346518A (ja) * | 1989-07-14 | 1991-02-27 | Tokyo Electron Ltd | 流速測定装置 |
US5070813A (en) * | 1989-02-10 | 1991-12-10 | Tokyo Electron Limited | Coating apparatus |
JPH0451246A (ja) * | 1990-06-20 | 1992-02-19 | Nec Kyushu Ltd | 露光パターン形成装置 |
KR100714263B1 (ko) * | 2000-11-09 | 2007-05-02 | 삼성전자주식회사 | 반도체 코팅설비의 풍속변화에 의한 에러감지장치 |
JP2014175581A (ja) * | 2013-03-12 | 2014-09-22 | Tokyo Electron Ltd | 基板液処理装置および気流異常検出方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58171819A (ja) * | 1982-04-01 | 1983-10-08 | Toshiba Corp | 半導体処理装置 |
-
1985
- 1985-10-29 JP JP24067385A patent/JPS62102854A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58171819A (ja) * | 1982-04-01 | 1983-10-08 | Toshiba Corp | 半導体処理装置 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63313160A (ja) * | 1987-06-16 | 1988-12-21 | Dainippon Printing Co Ltd | フォトマスク用基板等へのレジスト塗布方法およびスピンナチャック装置 |
US5070813A (en) * | 1989-02-10 | 1991-12-10 | Tokyo Electron Limited | Coating apparatus |
JPH0346518A (ja) * | 1989-07-14 | 1991-02-27 | Tokyo Electron Ltd | 流速測定装置 |
JPH0451246A (ja) * | 1990-06-20 | 1992-02-19 | Nec Kyushu Ltd | 露光パターン形成装置 |
KR100714263B1 (ko) * | 2000-11-09 | 2007-05-02 | 삼성전자주식회사 | 반도체 코팅설비의 풍속변화에 의한 에러감지장치 |
JP2014175581A (ja) * | 2013-03-12 | 2014-09-22 | Tokyo Electron Ltd | 基板液処理装置および気流異常検出方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0472590B2 (enrdf_load_stackoverflow) | 1992-11-18 |
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