JPS6197966A - 半導体装置 - Google Patents
半導体装置Info
- Publication number
- JPS6197966A JPS6197966A JP59219830A JP21983084A JPS6197966A JP S6197966 A JPS6197966 A JP S6197966A JP 59219830 A JP59219830 A JP 59219830A JP 21983084 A JP21983084 A JP 21983084A JP S6197966 A JPS6197966 A JP S6197966A
- Authority
- JP
- Japan
- Prior art keywords
- region
- base
- emitter
- barrier
- gaas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/36—Unipolar devices
- H10D48/362—Unipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions, e.g. hot electron transistors [HET], metal base transistors [MBT], resonant tunnelling transistors [RTT], bulk barrier transistors [BBT], planar doped barrier transistors [PDBT] or charge injection transistors [CHINT]
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59219830A JPS6197966A (ja) | 1984-10-19 | 1984-10-19 | 半導体装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59219830A JPS6197966A (ja) | 1984-10-19 | 1984-10-19 | 半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6197966A true JPS6197966A (ja) | 1986-05-16 |
| JPH0458706B2 JPH0458706B2 (enrdf_load_stackoverflow) | 1992-09-18 |
Family
ID=16741708
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59219830A Granted JPS6197966A (ja) | 1984-10-19 | 1984-10-19 | 半導体装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6197966A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS627159A (ja) * | 1985-07-03 | 1987-01-14 | Agency Of Ind Science & Technol | 半導体装置 |
| JPS6340369A (ja) * | 1986-08-05 | 1988-02-20 | Nec Corp | ホツト・エレクトロン・トランジスタ |
| US4967254A (en) * | 1987-07-16 | 1990-10-30 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device |
| US5436192A (en) * | 1989-03-24 | 1995-07-25 | Xerox Corporation | Method of fabricating semiconductor structures via photo induced evaporation enhancement during in situ epitaxial growth |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4998969A (enrdf_load_stackoverflow) * | 1973-01-24 | 1974-09-19 | ||
| JPS5039076A (enrdf_load_stackoverflow) * | 1973-08-08 | 1975-04-10 | ||
| JPS56114370A (en) * | 1980-02-04 | 1981-09-08 | Ibm | Semiconductor device |
-
1984
- 1984-10-19 JP JP59219830A patent/JPS6197966A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4998969A (enrdf_load_stackoverflow) * | 1973-01-24 | 1974-09-19 | ||
| JPS5039076A (enrdf_load_stackoverflow) * | 1973-08-08 | 1975-04-10 | ||
| JPS56114370A (en) * | 1980-02-04 | 1981-09-08 | Ibm | Semiconductor device |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS627159A (ja) * | 1985-07-03 | 1987-01-14 | Agency Of Ind Science & Technol | 半導体装置 |
| JPS6340369A (ja) * | 1986-08-05 | 1988-02-20 | Nec Corp | ホツト・エレクトロン・トランジスタ |
| US4967254A (en) * | 1987-07-16 | 1990-10-30 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device |
| US5436192A (en) * | 1989-03-24 | 1995-07-25 | Xerox Corporation | Method of fabricating semiconductor structures via photo induced evaporation enhancement during in situ epitaxial growth |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0458706B2 (enrdf_load_stackoverflow) | 1992-09-18 |
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