JPS6197918A - Ｘ線露光装置 - Google Patents

Ｘ線露光装置

Info

Publication number
JPS6197918A
JPS6197918A JP59218383A JP21838384A JPS6197918A JP S6197918 A JPS6197918 A JP S6197918A JP 59218383 A JP59218383 A JP 59218383A JP 21838384 A JP21838384 A JP 21838384A JP S6197918 A JPS6197918 A JP S6197918A
Authority
JP
Japan
Prior art keywords
ray
mask
low attenuation
attenuation chamber
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59218383A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0564453B2 (Direct
Inventor
Yukio Kenbo
行雄 見坊
Yoshihiro Yoneyama
米山　義弘
Minoru Ikeda
稔 池田
Akira Inagaki
晃 稲垣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59218383A priority Critical patent/JPS6197918A/ja
Priority to KR1019850007603A priority patent/KR900000437B1/ko
Priority to DE8585113171T priority patent/DE3579664D1/de
Priority to US06/788,861 priority patent/US4825453A/en
Priority to EP85113171A priority patent/EP0178660B1/en
Publication of JPS6197918A publication Critical patent/JPS6197918A/ja
Publication of JPH0564453B2 publication Critical patent/JPH0564453B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • G03F7/2039—X-ray radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Atmospheric Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59218383A 1984-10-19 1984-10-19 Ｘ線露光装置 Granted JPS6197918A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP59218383A JPS6197918A (ja) 1984-10-19 1984-10-19 Ｘ線露光装置
KR1019850007603A KR900000437B1 (ko) 1984-10-19 1985-10-16 X-레이 노광장치
DE8585113171T DE3579664D1 (de) 1984-10-19 1985-10-17 Roentgenstrahlbelichtungsgeraet.
US06/788,861 US4825453A (en) 1984-10-19 1985-10-17 X-ray exposure apparatus
EP85113171A EP0178660B1 (en) 1984-10-19 1985-10-17 X-ray exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59218383A JPS6197918A (ja) 1984-10-19 1984-10-19 Ｘ線露光装置

Publications (2)

Publication Number Publication Date
JPS6197918A true JPS6197918A (ja) 1986-05-16
JPH0564453B2 JPH0564453B2 (Direct) 1993-09-14

Family

ID=16719037

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59218383A Granted JPS6197918A (ja) 1984-10-19 1984-10-19 Ｘ線露光装置

Country Status (5)

Country Link
US (1) US4825453A (Direct)
EP (1) EP0178660B1 (Direct)
JP (1) JPS6197918A (Direct)
KR (1) KR900000437B1 (Direct)
DE (1) DE3579664D1 (Direct)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62291028A (ja) * 1986-06-10 1987-12-17 Nec Corp Ｘ線露光装置

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4648106A (en) * 1984-11-21 1987-03-03 Micronix Corporation Gas control for X-ray lithographic system
DE68929356T2 (de) * 1988-06-03 2002-05-23 Canon K.K., Tokio/Tokyo Verfahren und Vorrichtung zur Belichtung
EP0358521B1 (en) * 1988-09-09 1995-06-07 Canon Kabushiki Kaisha An exposure apparatus
JPH0276212A (ja) * 1988-09-13 1990-03-15 Canon Inc 多重露光方法
JP2623127B2 (ja) * 1988-10-05 1997-06-25 キヤノン株式会社 Ｘ線露光装置
US5267292A (en) * 1988-10-05 1993-11-30 Canon Kabushiki Kaisha X-ray exposure apparatus
JP2770960B2 (ja) * 1988-10-06 1998-07-02 キヤノン株式会社 Ｓｏｒ−ｘ線露光装置
JPH02156625A (ja) * 1988-12-09 1990-06-15 Canon Inc 直動案内装置
EP0422814B1 (en) * 1989-10-02 1999-03-17 Canon Kabushiki Kaisha Exposure apparatus
JP2860578B2 (ja) * 1990-03-02 1999-02-24 キヤノン株式会社 露光装置
JP3184582B2 (ja) * 1991-11-01 2001-07-09 キヤノン株式会社 Ｘ線露光装置およびｘ線露光方法
US5512395A (en) * 1993-04-30 1996-04-30 Lsi Logic Corporation Image masks for semiconductor lithography
US5572562A (en) * 1993-04-30 1996-11-05 Lsi Logic Corporation Image mask substrate for X-ray semiconductor lithography
AU6853598A (en) * 1997-04-18 1998-11-13 Nikon Corporation Aligner, exposure method using the aligner, and method of manufacture of circuitdevice
KR20010112265A (ko) * 1999-02-12 2001-12-20 시마무라 테루오 노광방법 및 장치
US6364386B1 (en) 1999-10-27 2002-04-02 Agilent Technologies, Inc. Apparatus and method for handling an integrated circuit
US7508487B2 (en) * 2000-06-01 2009-03-24 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
TWI226972B (en) * 2000-06-01 2005-01-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6576912B2 (en) * 2001-01-03 2003-06-10 Hugo M. Visser Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window
JP2002299221A (ja) * 2001-04-02 2002-10-11 Canon Inc Ｘ線露光装置
SG10201803122UA (en) * 2003-04-11 2018-06-28 Nikon Corp Immersion lithography apparatus and device manufacturing method
TWI612556B (zh) * 2003-05-23 2018-01-21 尼康股份有限公司 曝光裝置、曝光方法及元件製造方法
KR20170016532A (ko) * 2004-06-09 2017-02-13 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US8698998B2 (en) * 2004-06-21 2014-04-15 Nikon Corporation Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
KR101342303B1 (ko) * 2004-06-21 2013-12-16 가부시키가이샤 니콘 노광 장치 및 그 부재의 세정 방법, 노광 장치의 메인터넌스 방법, 메인터넌스 기기, 그리고 디바이스 제조 방법

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6170721A (ja) * 1984-09-14 1986-04-11 Toshiba Corp Ｘ線露光装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2307754A (en) * 1940-08-03 1943-01-12 Allis Chalmers Mfg Co Hydrogen-filled apparatus
US2804102A (en) * 1954-08-09 1957-08-27 Ralph D Cooksley Automatic pressure container vacuumizing, filling and charging machine
US4119855A (en) * 1977-07-08 1978-10-10 Massachusetts Institute Of Technology Non vacuum soft x-ray lithographic source
FR2475728A1 (fr) * 1980-02-11 1981-08-14 Cit Alcatel Detecteur de fuites a helium
JPS57169242A (en) * 1981-04-13 1982-10-18 Hitachi Ltd X-ray transferring device
US4349418A (en) * 1981-07-28 1982-09-14 Allied Corporation Production of methylnaphthalenes and tar bases including indole
JPS58191433A (ja) * 1982-05-04 1983-11-08 Fujitsu Ltd Ｘ線転写方法および装置
JPS59101833A (ja) * 1982-12-03 1984-06-12 Hitachi Ltd Ｘ線露光装置
US4648106A (en) * 1984-11-21 1987-03-03 Micronix Corporation Gas control for X-ray lithographic system

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6170721A (ja) * 1984-09-14 1986-04-11 Toshiba Corp Ｘ線露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62291028A (ja) * 1986-06-10 1987-12-17 Nec Corp Ｘ線露光装置

Also Published As

Publication number Publication date
JPH0564453B2 (Direct) 1993-09-14
EP0178660B1 (en) 1990-09-12
DE3579664D1 (de) 1990-10-18
KR860003649A (ko) 1986-05-28
EP0178660A2 (en) 1986-04-23
EP0178660A3 (en) 1988-04-20
US4825453A (en) 1989-04-25
KR900000437B1 (ko) 1990-01-30

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