DE68925604T2 - S.O.R.-Belichtungssystem - Google Patents

S.O.R.-Belichtungssystem

Info

Publication number
DE68925604T2
DE68925604T2 DE68925604T DE68925604T DE68925604T2 DE 68925604 T2 DE68925604 T2 DE 68925604T2 DE 68925604 T DE68925604 T DE 68925604T DE 68925604 T DE68925604 T DE 68925604T DE 68925604 T2 DE68925604 T2 DE 68925604T2
Authority
DE
Germany
Prior art keywords
exposure system
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68925604T
Other languages
English (en)
Other versions
DE68925604D1 (de
Inventor
Koji Uda
Yutaka Tanaka
Tetsuzo Mori
Isamu Shimoda
Schunichi Uzawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE68925604D1 publication Critical patent/DE68925604D1/de
Publication of DE68925604T2 publication Critical patent/DE68925604T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
DE68925604T 1988-09-05 1989-09-04 S.O.R.-Belichtungssystem Expired - Fee Related DE68925604T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63220488A JP2627543B2 (ja) 1988-09-05 1988-09-05 Ｓｏｒ露光システム

Publications (2)

Publication Number Publication Date
DE68925604D1 DE68925604D1 (de) 1996-03-21
DE68925604T2 true DE68925604T2 (de) 1996-07-11

Family

ID=16751856

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68925604T Expired - Fee Related DE68925604T2 (de) 1988-09-05 1989-09-04 S.O.R.-Belichtungssystem

Country Status (4)

Country Link
US (1) US5001734A (de)
EP (1) EP0358426B1 (de)
JP (1) JP2627543B2 (de)
DE (1) DE68925604T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2728898B2 (ja) * 1988-10-05 1998-03-18 キヤノン株式会社 露光装置
EP0447175B1 (de) * 1990-03-13 1997-11-19 Canon Kabushiki Kaisha Belichtungsanordnung mittels Synchrotronstrahlung
JP2959579B2 (ja) * 1990-06-19 1999-10-06 キヤノン株式会社 Ｘ線露光装置
JP3336436B2 (ja) * 1991-04-02 2002-10-21 株式会社ニコン リソグラフィシステム、情報収集装置、露光装置、及び半導体デバイス製造方法
JPH0661000A (ja) * 1992-08-07 1994-03-04 Hitachi Ltd 円形加速器及び円形加速器の運転方法並びに半導体露光装置
JP3210145B2 (ja) 1993-07-14 2001-09-17 キヤノン株式会社 走査型露光装置及び該装置を用いてデバイスを製造する方法
TW341719B (en) * 1996-03-01 1998-10-01 Canon Kk Surface position detecting method and scanning exposure method using the same
JP3138253B2 (ja) * 1997-03-27 2001-02-26 キヤノン株式会社 Ｘ線装置およびこれを用いたｘ線露光装置ならびにデバイス製造方法
UA59495C2 (uk) * 2000-08-07 2003-09-15 Мурадін Абубєкіровіч Кумахов Рентгенівський вимірювально-випробувальний комплекс
JP5042082B2 (ja) * 2008-03-17 2012-10-03 三菱電機株式会社 粒子線治療装置
DE102012212503B4 (de) * 2012-07-17 2014-11-20 Carl Zeiss Smt Gmbh Lithographieanlage und verfahren

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6032050A (ja) * 1983-08-02 1985-02-19 Canon Inc 露光装置
US4788698A (en) * 1984-04-15 1988-11-29 Hitachi, Ltd. X-ray exposure system
JPS62222634A (ja) * 1986-03-18 1987-09-30 Fujitsu Ltd Ｘ線露光方法
JPS639929A (ja) * 1986-06-30 1988-01-16 Nec Corp Ｘ線露光装置
JPS63116424A (ja) * 1986-11-05 1988-05-20 Nec Corp Ｘ線露光装置
JP2611762B2 (ja) * 1986-12-01 1997-05-21 キヤノン株式会社 Ｓｏｒ露光装置
JPS6461700A (en) * 1987-08-31 1989-03-08 Nec Corp Synchrotron radiation light exposing device
JPH1088400A (ja) * 1996-09-12 1998-04-07 Okuno Chem Ind Co Ltd 銀の電解剥離剤及び剥離液並びに電解剥離方法

Also Published As

Publication number Publication date
EP0358426A2 (de) 1990-03-14
EP0358426B1 (de) 1996-02-07
DE68925604D1 (de) 1996-03-21
EP0358426A3 (de) 1991-04-17
JPH0268919A (ja) 1990-03-08
JP2627543B2 (ja) 1997-07-09
US5001734A (en) 1991-03-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee