JPS6461700A - Synchrotron radiation light exposing device - Google Patents

Synchrotron radiation light exposing device

Info

Publication number
JPS6461700A
JPS6461700A JP62218815A JP21881587A JPS6461700A JP S6461700 A JPS6461700 A JP S6461700A JP 62218815 A JP62218815 A JP 62218815A JP 21881587 A JP21881587 A JP 21881587A JP S6461700 A JPS6461700 A JP S6461700A
Authority
JP
Japan
Prior art keywords
window
valve
sensor
box
radiation light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62218815A
Other languages
Japanese (ja)
Other versions
JPH0511920B2 (en
Inventor
Koichi Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62218815A priority Critical patent/JPS6461700A/en
Publication of JPS6461700A publication Critical patent/JPS6461700A/en
Publication of JPH0511920B2 publication Critical patent/JPH0511920B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Particle Accelerators (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To obtain a synchrotron radiation light exposing device having high reliability by installing plural pieces of high-speed shut-off valves which operate by sensing vacuum breakage to a beam line. CONSTITUTION:The beam line is provided with a mirror box 2 and a radiation light taking out window 6 and the exposing device 7 thereof is installed near the window 6. The high-speed shut-off valve 9 and the sensor 10 thereof are then installed to the upper stream of the box 2. The high-speed shut-off valve 11 is installed to the down stream of the box 2 on the upper stream of the window 6 and the sensor 12 thereof is installed to the upper stream of the window 6. The sensor 12 operates and the valve 11 is closed when the window 6 breaks according to this constitution. The sensor 10 operates and the valve 9 is closed in the case of leakage from the box 2. The infiltration of the atmospheric air to a storage ring 8 is thereby prevented and the reliability is enhanced.
JP62218815A 1987-08-31 1987-08-31 Synchrotron radiation light exposing device Granted JPS6461700A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62218815A JPS6461700A (en) 1987-08-31 1987-08-31 Synchrotron radiation light exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62218815A JPS6461700A (en) 1987-08-31 1987-08-31 Synchrotron radiation light exposing device

Publications (2)

Publication Number Publication Date
JPS6461700A true JPS6461700A (en) 1989-03-08
JPH0511920B2 JPH0511920B2 (en) 1993-02-16

Family

ID=16725778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62218815A Granted JPS6461700A (en) 1987-08-31 1987-08-31 Synchrotron radiation light exposing device

Country Status (1)

Country Link
JP (1) JPS6461700A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0358426A2 (en) * 1988-09-05 1990-03-14 Canon Kabushiki Kaisha SOR exposure system
EP0422814A2 (en) * 1989-10-02 1991-04-17 Canon Kabushiki Kaisha Exposure apparatus
EP0462756A2 (en) * 1990-06-19 1991-12-27 Canon Kabushiki Kaisha X-ray exposure apparatus
JP2015526770A (en) * 2012-09-05 2015-09-10 カール・ツァイス・エスエムティー・ゲーエムベーハー Block element for protecting optical element of projection exposure apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0358426A2 (en) * 1988-09-05 1990-03-14 Canon Kabushiki Kaisha SOR exposure system
EP0422814A2 (en) * 1989-10-02 1991-04-17 Canon Kabushiki Kaisha Exposure apparatus
EP0422814B1 (en) * 1989-10-02 1999-03-17 Canon Kabushiki Kaisha Exposure apparatus
EP0462756A2 (en) * 1990-06-19 1991-12-27 Canon Kabushiki Kaisha X-ray exposure apparatus
JP2015526770A (en) * 2012-09-05 2015-09-10 カール・ツァイス・エスエムティー・ゲーエムベーハー Block element for protecting optical element of projection exposure apparatus

Also Published As

Publication number Publication date
JPH0511920B2 (en) 1993-02-16

Similar Documents

Publication Publication Date Title
JPS5433683A (en) Air seal mounting for light emitting element
JPS6461700A (en) Synchrotron radiation light exposing device
JPS52100277A (en) Absorption photometer
JPS6488550A (en) Photomask
EP0058137A3 (en) Apparatus for providing x-rays
JPS6435299A (en) Protection of x-ray source and device therefor
JPS5538068A (en) Preparation of semiconductor device
ATE16217T1 (en) HELIUM LEAK DETECTOR.
JPS54134992A (en) Semiconductor device
HK1010250A1 (en) Watch especially pocket-watch
SE8501589L (en) POROS FORM OR FORM AND AS WELL AS ITS MANUFACTURE
JPS5770569A (en) Imaging method
JPS57182727A (en) Original size detecting device for copying machine or the like
JPS5790143A (en) Sensor
SU1552514A1 (en) Technological robot
JPS53126946A (en) Light guide of thyristor valve
JPS5556672A (en) Light-coupled semiconductor device
IT1261523B (en) VALVE COMPLEX WITH LEVEL INSPECTION TUBE.
JPS6425974A (en) Sputtering device
JPS5548636A (en) Method and device for increasing analysis sensitivity of atomic absorption and emission analysis
JPS6443708A (en) Dust protection device for measuring instrument using laser light
JPS5739335A (en) Gas leakage preventing device
JPS5588327A (en) Inspection device for flaw of mask
ES2061209T3 (en) CLOSING AND PROTECTION DEVICE FOR A GAS EVACUATION SYSTEM OF A VERTICAL LAUNCH MODULE.
JPS54158906A (en) Tape stopper