JPS6435299A - Protection of x-ray source and device therefor - Google Patents

Protection of x-ray source and device therefor

Info

Publication number
JPS6435299A
JPS6435299A JP62191801A JP19180187A JPS6435299A JP S6435299 A JPS6435299 A JP S6435299A JP 62191801 A JP62191801 A JP 62191801A JP 19180187 A JP19180187 A JP 19180187A JP S6435299 A JPS6435299 A JP S6435299A
Authority
JP
Japan
Prior art keywords
window
light
ray
reflection
monitoring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62191801A
Other languages
Japanese (ja)
Other versions
JPH0544000B2 (en
Inventor
Hidekazu Nomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62191801A priority Critical patent/JPS6435299A/en
Publication of JPS6435299A publication Critical patent/JPS6435299A/en
Publication of JPH0544000B2 publication Critical patent/JPH0544000B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Particle Accelerators (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)

Abstract

PURPOSE:To prevent the pressure rise of an X-ray source, by placing a light emitter at one side of X-ray extraction window and a light receiver at another side, and therewith monitoring the passage of the light or its reflection through the extracting window material and closing a shutoff valve. CONSTITUTION:An X-ray generating part and a space to utilize the X-ray extracted therefrom are isolated one another with an X-ray extracting window 2 made of a material impervious to the visible light and longer wave length one. In a helium chamber 3 located at an atmospheric pressure side of the window 2, a light emitter 5 is provided. A light flux 6 is cast diagonally at the center of the window 2. An end of optical fiber 8 having a focusing lens function is located at the mirror reflection position of the incident light flux. By monitoring light passage through the window material 2 and/or reflection, the breakage of the window 2 is detected and the shutoff valve 13 is closed, and thereby pressure rise at the X-ray generating part is prevented.
JP62191801A 1987-07-30 1987-07-30 Protection of x-ray source and device therefor Granted JPS6435299A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62191801A JPS6435299A (en) 1987-07-30 1987-07-30 Protection of x-ray source and device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62191801A JPS6435299A (en) 1987-07-30 1987-07-30 Protection of x-ray source and device therefor

Publications (2)

Publication Number Publication Date
JPS6435299A true JPS6435299A (en) 1989-02-06
JPH0544000B2 JPH0544000B2 (en) 1993-07-05

Family

ID=16280762

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62191801A Granted JPS6435299A (en) 1987-07-30 1987-07-30 Protection of x-ray source and device therefor

Country Status (1)

Country Link
JP (1) JPS6435299A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5805726A (en) * 1995-08-11 1998-09-08 Industrial Technology Research Institute Piezoelectric full-range loudspeaker
JP2015526770A (en) * 2012-09-05 2015-09-10 カール・ツァイス・エスエムティー・ゲーエムベーハー Block element for protecting optical element of projection exposure apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61288125A (en) * 1985-06-17 1986-12-18 Hitachi Ltd Impulse wave detector

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61288125A (en) * 1985-06-17 1986-12-18 Hitachi Ltd Impulse wave detector

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5805726A (en) * 1995-08-11 1998-09-08 Industrial Technology Research Institute Piezoelectric full-range loudspeaker
JP2015526770A (en) * 2012-09-05 2015-09-10 カール・ツァイス・エスエムティー・ゲーエムベーハー Block element for protecting optical element of projection exposure apparatus

Also Published As

Publication number Publication date
JPH0544000B2 (en) 1993-07-05

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees