JPS6195593A - 半導体レ−ザ素子 - Google Patents

半導体レ−ザ素子

Info

Publication number
JPS6195593A
JPS6195593A JP59217782A JP21778284A JPS6195593A JP S6195593 A JPS6195593 A JP S6195593A JP 59217782 A JP59217782 A JP 59217782A JP 21778284 A JP21778284 A JP 21778284A JP S6195593 A JPS6195593 A JP S6195593A
Authority
JP
Japan
Prior art keywords
laser
current
region
width
semiconductor laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59217782A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0114717B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Nobuyuki Miyauchi
宮内　伸幸
Shigeki Maei
茂樹 前井
Osamu Yamamoto
修 山本
Taiji Morimoto
泰司 森本
Hiroshi Hayashi
寛 林
Saburo Yamamoto
三郎 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP59217782A priority Critical patent/JPS6195593A/ja
Priority to EP85307428A priority patent/EP0178912B1/en
Priority to DE8585307428T priority patent/DE3583202D1/de
Priority to US06/787,760 priority patent/US4730328A/en
Publication of JPS6195593A publication Critical patent/JPS6195593A/ja
Publication of JPH0114717B2 publication Critical patent/JPH0114717B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/16—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/24—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a grooved structure, e.g. V-grooved, crescent active layer in groove, VSIS laser

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Geometry (AREA)
  • Semiconductor Lasers (AREA)
JP59217782A 1984-10-16 1984-10-16 半導体レ−ザ素子 Granted JPS6195593A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP59217782A JPS6195593A (ja) 1984-10-16 1984-10-16 半導体レ−ザ素子
EP85307428A EP0178912B1 (en) 1984-10-16 1985-10-15 A semiconductor laser
DE8585307428T DE3583202D1 (de) 1984-10-16 1985-10-15 Halbleiterlaser.
US06/787,760 US4730328A (en) 1984-10-16 1985-10-15 Window structure semiconductor laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59217782A JPS6195593A (ja) 1984-10-16 1984-10-16 半導体レ−ザ素子

Publications (2)

Publication Number Publication Date
JPS6195593A true JPS6195593A (ja) 1986-05-14
JPH0114717B2 JPH0114717B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-03-14

Family

ID=16709641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59217782A Granted JPS6195593A (ja) 1984-10-16 1984-10-16 半導体レ−ザ素子

Country Status (4)

Country Link
US (1) US4730328A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0178912B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS6195593A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3583202D1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6218783A (ja) * 1985-07-17 1987-01-27 Sharp Corp 半導体レ−ザ素子
JPH0671121B2 (ja) * 1987-09-04 1994-09-07 シャープ株式会社 半導体レーザ装置
GB2283858A (en) * 1993-11-12 1995-05-17 British Tech Group Semiconductor laser
US6996150B1 (en) 1994-09-14 2006-02-07 Rohm Co., Ltd. Semiconductor light emitting device and manufacturing method therefor
US7177330B2 (en) * 2003-03-17 2007-02-13 Hong Kong Polytechnic University Method and apparatus for controlling the polarization of an optical signal
JP4077348B2 (ja) * 2003-03-17 2008-04-16 松下電器産業株式会社 半導体レーザ装置およびそれを用いた光ピックアップ装置
DE102012110836A1 (de) * 2012-11-12 2014-02-27 Osram Opto Semiconductors Gmbh Optoelektronischer Halbleiterchip und Verfahren zur Herstellung von optoelektronischen Halbleiterchips

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3376936D1 (en) * 1982-05-28 1988-07-07 Sharp Kk Semiconductor laser
JPS5940592A (ja) * 1982-08-30 1984-03-06 Sharp Corp 半導体レ−ザ素子

Also Published As

Publication number Publication date
US4730328A (en) 1988-03-08
JPH0114717B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-03-14
EP0178912B1 (en) 1991-06-12
DE3583202D1 (de) 1991-07-18
EP0178912A3 (en) 1987-09-09
EP0178912A2 (en) 1986-04-23

Similar Documents

Publication Publication Date Title
Tsukada GaAs–Ga1− x Al x As buried‐heterostructure injection lasers
JP5406858B2 (ja) 電気的にポンプされる空洞がジグザグに延長された半導体表面放出レーザ及びスーパールミネセントｌｅｄ
Botez cw high‐power single‐mode operation of constricted double‐heterojunction AlGaAs lasers with a large optical cavity
US6653662B2 (en) Semiconductor light-emitting device, method for fabricating the same, and method for driving the same
CN1113354A (zh) 半导体二极管激光器及其制造方法
JPS59988A (ja) ヘテロ接合注入形レ−ザ
JPH0556036B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP3206555B2 (ja) 窒化ガリウム系半導体発光素子及びその製造方法
JPS6343908B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS6195593A (ja) 半導体レ−ザ素子
Botez Constricted double-heterojunction AlGaAs diode lasers: Structures and electrooptical characteristics
JP2004007002A (ja) 半導体発光装置及びその製造方法
JPH02156588A (ja) 半導体レーザおよびその製造方法
Wu et al. Single‐longitudinal‐mode GaAs/GaAlAs channeled‐substrate lasers grown by molecular beam epitaxy
US4745611A (en) Buried twin ridge substrate laser
JP3255111B2 (ja) 半導体レーザ及びその製造方法
JPH0671121B2 (ja) 半導体レーザ装置
JPS5839085A (ja) 半導体レ−ザ装置
JPH0268975A (ja) 半導体レーザ
JP3734740B2 (ja) 半導体レーザ素子
JP3549514B2 (ja) 半導体発光装置の駆動方法
JPS6190489A (ja) 半導体レ−ザ装置およびその製造方法
JP3172558B2 (ja) 半導体能動素子
JPS62152192A (ja) 垂直発振型レーザ
JPH02135789A (ja) 半導体レーザ