JPS6191982A - 放電励起エキシマレ−ザ装置 - Google Patents
放電励起エキシマレ−ザ装置Info
- Publication number
- JPS6191982A JPS6191982A JP21363384A JP21363384A JPS6191982A JP S6191982 A JPS6191982 A JP S6191982A JP 21363384 A JP21363384 A JP 21363384A JP 21363384 A JP21363384 A JP 21363384A JP S6191982 A JPS6191982 A JP S6191982A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- discharge
- main discharge
- dielectric
- auxiliary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005284 excitation Effects 0.000 title 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 29
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 7
- 150000002367 halogens Chemical class 0.000 claims abstract description 7
- 230000003287 optical effect Effects 0.000 claims abstract description 3
- 229910052573 porcelain Inorganic materials 0.000 claims description 17
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 11
- 229910052731 fluorine Inorganic materials 0.000 claims description 11
- 239000011737 fluorine Substances 0.000 claims description 11
- 239000003989 dielectric material Substances 0.000 claims description 6
- 238000009413 insulation Methods 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 7
- 230000006866 deterioration Effects 0.000 abstract description 5
- 238000000034 method Methods 0.000 abstract description 3
- 230000007774 longterm Effects 0.000 abstract 1
- 238000012216 screening Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 33
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 239000010453 quartz Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 8
- 230000007423 decrease Effects 0.000 description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 239000012535 impurity Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 238000009412 basement excavation Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0384—Auxiliary electrodes, e.g. for pre-ionisation or triggering, or particular adaptations therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Priority Applications (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21363384A JPS6191982A (ja) | 1984-10-11 | 1984-10-11 | 放電励起エキシマレ−ザ装置 |
US06/782,568 US4686682A (en) | 1984-10-09 | 1985-10-01 | Discharge excitation type short pulse laser device |
DE19853588088 DE3588088T2 (de) | 1984-10-09 | 1985-10-02 | Entladungsangeregter Laser zur Erzeugung kurzer Pulse |
EP93100550A EP0543795B1 (en) | 1984-10-09 | 1985-10-02 | Discharge excitation type short pulse laser device |
EP94114362A EP0637106B1 (en) | 1984-10-09 | 1985-10-02 | Discharge excitation type laser device |
DE19853588118 DE3588118T2 (de) | 1984-10-09 | 1985-10-02 | Entladungsangeregter Laser zur Erzeugung kurzer Pulse |
DE19853588137 DE3588137T2 (de) | 1984-10-09 | 1985-10-02 | Entladungsangeregtes Lasergerät |
DE3587852T DE3587852T2 (de) | 1984-10-09 | 1985-10-02 | Kurzpulslaservorrichtung vom Entladungsanregungstyp. |
EP85112484A EP0177888B1 (en) | 1984-10-09 | 1985-10-02 | Discharge excitation type short pulse laser device |
EP93100578A EP0542718B1 (en) | 1984-10-09 | 1985-10-02 | Discharge excitation type short pulse laser device |
CA000492327A CA1259122A (en) | 1984-10-09 | 1985-10-04 | Discharge excitation type short pulse laser device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21363384A JPS6191982A (ja) | 1984-10-11 | 1984-10-11 | 放電励起エキシマレ−ザ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6191982A true JPS6191982A (ja) | 1986-05-10 |
JPH024148B2 JPH024148B2 (enrdf_load_stackoverflow) | 1990-01-26 |
Family
ID=16642383
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21363384A Granted JPS6191982A (ja) | 1984-10-09 | 1984-10-11 | 放電励起エキシマレ−ザ装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6191982A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6546036B1 (en) | 1999-06-08 | 2003-04-08 | Lambda Physik Ag | Roof configuration for laser discharge electrodes |
US6570901B2 (en) | 2000-02-24 | 2003-05-27 | Lambda Physik Ag | Excimer or molecular fluorine laser having lengthened electrodes |
US6785316B1 (en) | 1999-08-17 | 2004-08-31 | Lambda Physik Ag | Excimer or molecular laser with optimized spectral purity |
US7266137B2 (en) | 1999-02-10 | 2007-09-04 | Lambda Physik Ag | Laser gas replenishment method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58105161A (ja) * | 1981-11-26 | 1983-06-22 | Konishiroku Photo Ind Co Ltd | 磁性トナ− |
-
1984
- 1984-10-11 JP JP21363384A patent/JPS6191982A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58105161A (ja) * | 1981-11-26 | 1983-06-22 | Konishiroku Photo Ind Co Ltd | 磁性トナ− |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7266137B2 (en) | 1999-02-10 | 2007-09-04 | Lambda Physik Ag | Laser gas replenishment method |
US6546036B1 (en) | 1999-06-08 | 2003-04-08 | Lambda Physik Ag | Roof configuration for laser discharge electrodes |
US6785316B1 (en) | 1999-08-17 | 2004-08-31 | Lambda Physik Ag | Excimer or molecular laser with optimized spectral purity |
US6570901B2 (en) | 2000-02-24 | 2003-05-27 | Lambda Physik Ag | Excimer or molecular fluorine laser having lengthened electrodes |
Also Published As
Publication number | Publication date |
---|---|
JPH024148B2 (enrdf_load_stackoverflow) | 1990-01-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |