JPS6184025A - 半導体素子表面への皮膜形成方法 - Google Patents

半導体素子表面への皮膜形成方法

Info

Publication number
JPS6184025A
JPS6184025A JP59205253A JP20525384A JPS6184025A JP S6184025 A JPS6184025 A JP S6184025A JP 59205253 A JP59205253 A JP 59205253A JP 20525384 A JP20525384 A JP 20525384A JP S6184025 A JPS6184025 A JP S6184025A
Authority
JP
Japan
Prior art keywords
film
solution
forming
polyimide film
semiconductor element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59205253A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0329292B2 (https=
Inventor
Kazumasa Igarashi
一雅 五十嵐
Naoki Inoue
直樹 井上
Katsuhiko Yamaguchi
勝彦 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Electric Industrial Co Ltd filed Critical Nitto Electric Industrial Co Ltd
Priority to JP59205253A priority Critical patent/JPS6184025A/ja
Publication of JPS6184025A publication Critical patent/JPS6184025A/ja
Publication of JPH0329292B2 publication Critical patent/JPH0329292B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/68—Organic materials, e.g. photoresists
    • H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP59205253A 1984-09-29 1984-09-29 半導体素子表面への皮膜形成方法 Granted JPS6184025A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59205253A JPS6184025A (ja) 1984-09-29 1984-09-29 半導体素子表面への皮膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59205253A JPS6184025A (ja) 1984-09-29 1984-09-29 半導体素子表面への皮膜形成方法

Publications (2)

Publication Number Publication Date
JPS6184025A true JPS6184025A (ja) 1986-04-28
JPH0329292B2 JPH0329292B2 (https=) 1991-04-23

Family

ID=16503923

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59205253A Granted JPS6184025A (ja) 1984-09-29 1984-09-29 半導体素子表面への皮膜形成方法

Country Status (1)

Country Link
JP (1) JPS6184025A (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5094919A (en) * 1988-06-30 1992-03-10 Nippon Steel Chemical Co., Ltd. Polyimide copolymers and process for preparing the same
JP2002093958A (ja) * 2000-09-20 2002-03-29 Fuji Electric Co Ltd 半導体素子の保護膜用ポリイミド樹脂およびそれを用いた半導体装置
JP2023033668A (ja) * 2021-08-30 2023-03-13 株式会社 日立パワーデバイス 半導体装置及びその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57143328A (en) * 1981-02-27 1982-09-04 Nitto Electric Ind Co Ltd Production of siloxane-modified polyimide precursor
JPS5976451A (ja) * 1982-10-26 1984-05-01 Hitachi Ltd 半導体装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57143328A (en) * 1981-02-27 1982-09-04 Nitto Electric Ind Co Ltd Production of siloxane-modified polyimide precursor
JPS5976451A (ja) * 1982-10-26 1984-05-01 Hitachi Ltd 半導体装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5094919A (en) * 1988-06-30 1992-03-10 Nippon Steel Chemical Co., Ltd. Polyimide copolymers and process for preparing the same
JP2002093958A (ja) * 2000-09-20 2002-03-29 Fuji Electric Co Ltd 半導体素子の保護膜用ポリイミド樹脂およびそれを用いた半導体装置
JP2023033668A (ja) * 2021-08-30 2023-03-13 株式会社 日立パワーデバイス 半導体装置及びその製造方法

Also Published As

Publication number Publication date
JPH0329292B2 (https=) 1991-04-23

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term