JPH0329174B2 - - Google Patents

Info

Publication number
JPH0329174B2
JPH0329174B2 JP59163700A JP16370084A JPH0329174B2 JP H0329174 B2 JPH0329174 B2 JP H0329174B2 JP 59163700 A JP59163700 A JP 59163700A JP 16370084 A JP16370084 A JP 16370084A JP H0329174 B2 JPH0329174 B2 JP H0329174B2
Authority
JP
Japan
Prior art keywords
film
polyimide
bis
forming
mol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59163700A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6142142A (ja
Inventor
Kazumasa Igarashi
Katsuhiko Yamaguchi
Naoki Inoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP59163700A priority Critical patent/JPS6142142A/ja
Publication of JPS6142142A publication Critical patent/JPS6142142A/ja
Publication of JPH0329174B2 publication Critical patent/JPH0329174B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/68—Organic materials, e.g. photoresists
    • H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP59163700A 1984-08-02 1984-08-02 半導体素子表面への皮膜形成方法 Granted JPS6142142A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59163700A JPS6142142A (ja) 1984-08-02 1984-08-02 半導体素子表面への皮膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59163700A JPS6142142A (ja) 1984-08-02 1984-08-02 半導体素子表面への皮膜形成方法

Publications (2)

Publication Number Publication Date
JPS6142142A JPS6142142A (ja) 1986-02-28
JPH0329174B2 true JPH0329174B2 (https=) 1991-04-23

Family

ID=15778950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59163700A Granted JPS6142142A (ja) 1984-08-02 1984-08-02 半導体素子表面への皮膜形成方法

Country Status (1)

Country Link
JP (1) JPS6142142A (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62183127A (ja) * 1986-02-06 1987-08-11 Fuji Electric Co Ltd 半導体素子の製造方法
JP2006060005A (ja) * 2004-08-19 2006-03-02 Shin Etsu Chem Co Ltd 発光装置及びその製造方法
JP6884026B2 (ja) * 2017-04-19 2021-06-09 三井化学株式会社 半導体用膜形成用組成物、半導体用膜形成用組成物の製造方法、半導体用部材の製造方法、及び半導体用工程材の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5813087B2 (ja) * 1981-02-27 1983-03-11 日東電工株式会社 シロキサン変性ポリイミド前駆体の製造方法
JPS5976451A (ja) * 1982-10-26 1984-05-01 Hitachi Ltd 半導体装置

Also Published As

Publication number Publication date
JPS6142142A (ja) 1986-02-28

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term