JPS6142142A - 半導体素子表面への皮膜形成方法 - Google Patents

半導体素子表面への皮膜形成方法

Info

Publication number
JPS6142142A
JPS6142142A JP59163700A JP16370084A JPS6142142A JP S6142142 A JPS6142142 A JP S6142142A JP 59163700 A JP59163700 A JP 59163700A JP 16370084 A JP16370084 A JP 16370084A JP S6142142 A JPS6142142 A JP S6142142A
Authority
JP
Japan
Prior art keywords
polyimide
film
forming
solution
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59163700A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0329174B2 (https=
Inventor
Kazumasa Igarashi
一雅 五十嵐
Katsuhiko Yamaguchi
勝彦 山口
Naoki Inoue
直樹 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Electric Industrial Co Ltd filed Critical Nitto Electric Industrial Co Ltd
Priority to JP59163700A priority Critical patent/JPS6142142A/ja
Publication of JPS6142142A publication Critical patent/JPS6142142A/ja
Publication of JPH0329174B2 publication Critical patent/JPH0329174B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/68—Organic materials, e.g. photoresists
    • H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP59163700A 1984-08-02 1984-08-02 半導体素子表面への皮膜形成方法 Granted JPS6142142A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59163700A JPS6142142A (ja) 1984-08-02 1984-08-02 半導体素子表面への皮膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59163700A JPS6142142A (ja) 1984-08-02 1984-08-02 半導体素子表面への皮膜形成方法

Publications (2)

Publication Number Publication Date
JPS6142142A true JPS6142142A (ja) 1986-02-28
JPH0329174B2 JPH0329174B2 (https=) 1991-04-23

Family

ID=15778950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59163700A Granted JPS6142142A (ja) 1984-08-02 1984-08-02 半導体素子表面への皮膜形成方法

Country Status (1)

Country Link
JP (1) JPS6142142A (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62183127A (ja) * 1986-02-06 1987-08-11 Fuji Electric Co Ltd 半導体素子の製造方法
JP2006060005A (ja) * 2004-08-19 2006-03-02 Shin Etsu Chem Co Ltd 発光装置及びその製造方法
JP2018182199A (ja) * 2017-04-19 2018-11-15 三井化学株式会社 半導体用膜形成用組成物、半導体用膜形成用組成物の製造方法、半導体用部材の製造方法、及び半導体用工程材の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57143327A (en) * 1981-02-27 1982-09-04 Nitto Electric Ind Co Ltd Production of siloxane-modified polyimide precursor
JPS5976451A (ja) * 1982-10-26 1984-05-01 Hitachi Ltd 半導体装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57143327A (en) * 1981-02-27 1982-09-04 Nitto Electric Ind Co Ltd Production of siloxane-modified polyimide precursor
JPS5976451A (ja) * 1982-10-26 1984-05-01 Hitachi Ltd 半導体装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62183127A (ja) * 1986-02-06 1987-08-11 Fuji Electric Co Ltd 半導体素子の製造方法
JP2006060005A (ja) * 2004-08-19 2006-03-02 Shin Etsu Chem Co Ltd 発光装置及びその製造方法
JP2018182199A (ja) * 2017-04-19 2018-11-15 三井化学株式会社 半導体用膜形成用組成物、半導体用膜形成用組成物の製造方法、半導体用部材の製造方法、及び半導体用工程材の製造方法

Also Published As

Publication number Publication date
JPH0329174B2 (https=) 1991-04-23

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term