JPS6176662A - 薄膜形成方法および装置 - Google Patents

薄膜形成方法および装置

Info

Publication number
JPS6176662A
JPS6176662A JP19675484A JP19675484A JPS6176662A JP S6176662 A JPS6176662 A JP S6176662A JP 19675484 A JP19675484 A JP 19675484A JP 19675484 A JP19675484 A JP 19675484A JP S6176662 A JPS6176662 A JP S6176662A
Authority
JP
Japan
Prior art keywords
thin film
substrate
film forming
deposited
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19675484A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0582467B2 (OSRAM
Inventor
Fusao Shimokawa
房男 下川
Hiroki Kuwano
博喜 桑野
Kazutoshi Nagai
一敏 長井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP19675484A priority Critical patent/JPS6176662A/ja
Publication of JPS6176662A publication Critical patent/JPS6176662A/ja
Publication of JPH0582467B2 publication Critical patent/JPH0582467B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP19675484A 1984-09-21 1984-09-21 薄膜形成方法および装置 Granted JPS6176662A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19675484A JPS6176662A (ja) 1984-09-21 1984-09-21 薄膜形成方法および装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19675484A JPS6176662A (ja) 1984-09-21 1984-09-21 薄膜形成方法および装置

Publications (2)

Publication Number Publication Date
JPS6176662A true JPS6176662A (ja) 1986-04-19
JPH0582467B2 JPH0582467B2 (OSRAM) 1993-11-19

Family

ID=16363055

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19675484A Granted JPS6176662A (ja) 1984-09-21 1984-09-21 薄膜形成方法および装置

Country Status (1)

Country Link
JP (1) JPS6176662A (OSRAM)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6318050A (ja) * 1986-07-11 1988-01-25 Mitsubishi Heavy Ind Ltd Ｃｂｎ被覆法
JPS63262457A (ja) * 1987-04-20 1988-10-28 Nissin Electric Co Ltd 窒化ホウ素膜の作製方法
JPH02236268A (ja) * 1989-03-07 1990-09-19 Nissin Electric Co Ltd 窒化ホウ素膜の形成方法
JPH04221059A (ja) * 1990-12-20 1992-08-11 Mitsubishi Heavy Ind Ltd 立方晶窒化ほう素膜の形成方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5617632A (en) * 1979-07-20 1981-02-19 Nec Corp Converging method for ion

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5617632A (en) * 1979-07-20 1981-02-19 Nec Corp Converging method for ion

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6318050A (ja) * 1986-07-11 1988-01-25 Mitsubishi Heavy Ind Ltd Ｃｂｎ被覆法
JPS63262457A (ja) * 1987-04-20 1988-10-28 Nissin Electric Co Ltd 窒化ホウ素膜の作製方法
JPH02236268A (ja) * 1989-03-07 1990-09-19 Nissin Electric Co Ltd 窒化ホウ素膜の形成方法
JPH04221059A (ja) * 1990-12-20 1992-08-11 Mitsubishi Heavy Ind Ltd 立方晶窒化ほう素膜の形成方法

Also Published As

Publication number Publication date
JPH0582467B2 (OSRAM) 1993-11-19

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term