JPS6161154A - 微細ネガレジストパターン形成方法 - Google Patents

微細ネガレジストパターン形成方法

Info

Publication number
JPS6161154A
JPS6161154A JP59182589A JP18258984A JPS6161154A JP S6161154 A JPS6161154 A JP S6161154A JP 59182589 A JP59182589 A JP 59182589A JP 18258984 A JP18258984 A JP 18258984A JP S6161154 A JPS6161154 A JP S6161154A
Authority
JP
Japan
Prior art keywords
rays
pattern
resist
dry etching
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59182589A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0480377B2 (enrdf_load_stackoverflow
Inventor
Yoshio Yamashita
山下　吉雄
Takaharu Kawazu
河津　隆治
Takateru Asano
浅野　孝輝
Kenji Kobayashi
健二 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Yakuhin Kogyo KK
Oki Electric Industry Co Ltd
Original Assignee
Fuji Yakuhin Kogyo KK
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Yakuhin Kogyo KK, Oki Electric Industry Co Ltd filed Critical Fuji Yakuhin Kogyo KK
Priority to JP59182589A priority Critical patent/JPS6161154A/ja
Publication of JPS6161154A publication Critical patent/JPS6161154A/ja
Publication of JPH0480377B2 publication Critical patent/JPH0480377B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59182589A 1984-09-03 1984-09-03 微細ネガレジストパターン形成方法 Granted JPS6161154A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59182589A JPS6161154A (ja) 1984-09-03 1984-09-03 微細ネガレジストパターン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59182589A JPS6161154A (ja) 1984-09-03 1984-09-03 微細ネガレジストパターン形成方法

Publications (2)

Publication Number Publication Date
JPS6161154A true JPS6161154A (ja) 1986-03-28
JPH0480377B2 JPH0480377B2 (enrdf_load_stackoverflow) 1992-12-18

Family

ID=16120931

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59182589A Granted JPS6161154A (ja) 1984-09-03 1984-09-03 微細ネガレジストパターン形成方法

Country Status (1)

Country Link
JP (1) JPS6161154A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62273529A (ja) * 1986-05-10 1987-11-27 チバ−ガイギ−　アクチエンゲゼル　シヤフト 画像形成方法
JPS6373522A (ja) * 1986-09-16 1988-04-04 Matsushita Electronics Corp 半導体装置の製造方法
JPS63133626A (ja) * 1986-11-26 1988-06-06 Matsushita Electronics Corp 半導体装置の製造方法
JPS63200531A (ja) * 1987-02-17 1988-08-18 Matsushita Electronics Corp 半導体装置の製造方法
JPS6435438A (en) * 1987-07-01 1989-02-06 Ciba Geigy Ag Image formation
JPS6489424A (en) * 1987-09-30 1989-04-03 Matsushita Electronics Corp Resist-pattern forming method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4948403A (enrdf_load_stackoverflow) * 1972-05-05 1974-05-10
JPS50127619A (enrdf_load_stackoverflow) * 1974-03-27 1975-10-07
JPS50141404A (enrdf_load_stackoverflow) * 1974-04-30 1975-11-13

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4948403A (enrdf_load_stackoverflow) * 1972-05-05 1974-05-10
JPS50127619A (enrdf_load_stackoverflow) * 1974-03-27 1975-10-07
JPS50141404A (enrdf_load_stackoverflow) * 1974-04-30 1975-11-13

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62273529A (ja) * 1986-05-10 1987-11-27 チバ−ガイギ−　アクチエンゲゼル　シヤフト 画像形成方法
JPS6373522A (ja) * 1986-09-16 1988-04-04 Matsushita Electronics Corp 半導体装置の製造方法
JPS63133626A (ja) * 1986-11-26 1988-06-06 Matsushita Electronics Corp 半導体装置の製造方法
JPS63200531A (ja) * 1987-02-17 1988-08-18 Matsushita Electronics Corp 半導体装置の製造方法
JPS6435438A (en) * 1987-07-01 1989-02-06 Ciba Geigy Ag Image formation
JPS6489424A (en) * 1987-09-30 1989-04-03 Matsushita Electronics Corp Resist-pattern forming method

Also Published As

Publication number Publication date
JPH0480377B2 (enrdf_load_stackoverflow) 1992-12-18

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Legal Events

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