JPS50127619A - - Google Patents
Info
- Publication number
- JPS50127619A JPS50127619A JP3428574A JP3428574A JPS50127619A JP S50127619 A JPS50127619 A JP S50127619A JP 3428574 A JP3428574 A JP 3428574A JP 3428574 A JP3428574 A JP 3428574A JP S50127619 A JPS50127619 A JP S50127619A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP49034285A JPS5241050B2 (enrdf_load_stackoverflow) | 1974-03-27 | 1974-03-27 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP49034285A JPS5241050B2 (enrdf_load_stackoverflow) | 1974-03-27 | 1974-03-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS50127619A true JPS50127619A (enrdf_load_stackoverflow) | 1975-10-07 |
JPS5241050B2 JPS5241050B2 (enrdf_load_stackoverflow) | 1977-10-15 |
Family
ID=12409874
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP49034285A Expired JPS5241050B2 (enrdf_load_stackoverflow) | 1974-03-27 | 1974-03-27 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5241050B2 (enrdf_load_stackoverflow) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51120712A (en) * | 1975-04-15 | 1976-10-22 | Toshiba Corp | Positive type photo-resistant compound |
JPS60205444A (ja) * | 1984-02-25 | 1985-10-17 | ヘキスト・アクチエンゲゼルシヤフト | 感放射組成物及び感放射記録材料 |
JPS6161154A (ja) * | 1984-09-03 | 1986-03-28 | Oki Electric Ind Co Ltd | 微細ネガレジストパターン形成方法 |
JPS61278846A (ja) * | 1985-06-04 | 1986-12-09 | Sumitomo Chem Co Ltd | ポジ型フオトレジスト組成物 |
JPS6389864A (ja) * | 1986-10-03 | 1988-04-20 | Mitsubishi Kasei Corp | 感光性平版印刷版 |
JPS6435557A (en) * | 1987-07-31 | 1989-02-06 | Mitsubishi Chem Ind | Photosensitive planographic printing plate |
JPS6452139A (en) * | 1987-05-18 | 1989-02-28 | Konishiroku Photo Ind | Photosensitive composition |
JPH02867A (ja) * | 1987-11-26 | 1990-01-05 | Toshiba Corp | レジスト |
JPH02502312A (ja) * | 1987-12-10 | 1990-07-26 | マクダーミツド インコーポレーテツド | 像反転性乾燥フィルムホトレジスト |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL7305260A (enrdf_load_stackoverflow) * | 1972-05-05 | 1973-11-07 |
-
1974
- 1974-03-27 JP JP49034285A patent/JPS5241050B2/ja not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL7305260A (enrdf_load_stackoverflow) * | 1972-05-05 | 1973-11-07 | ||
JPS4948403A (enrdf_load_stackoverflow) * | 1972-05-05 | 1974-05-10 |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51120712A (en) * | 1975-04-15 | 1976-10-22 | Toshiba Corp | Positive type photo-resistant compound |
JPS60205444A (ja) * | 1984-02-25 | 1985-10-17 | ヘキスト・アクチエンゲゼルシヤフト | 感放射組成物及び感放射記録材料 |
JPS6161154A (ja) * | 1984-09-03 | 1986-03-28 | Oki Electric Ind Co Ltd | 微細ネガレジストパターン形成方法 |
JPS61278846A (ja) * | 1985-06-04 | 1986-12-09 | Sumitomo Chem Co Ltd | ポジ型フオトレジスト組成物 |
JPS6389864A (ja) * | 1986-10-03 | 1988-04-20 | Mitsubishi Kasei Corp | 感光性平版印刷版 |
JPS6452139A (en) * | 1987-05-18 | 1989-02-28 | Konishiroku Photo Ind | Photosensitive composition |
JPS6435557A (en) * | 1987-07-31 | 1989-02-06 | Mitsubishi Chem Ind | Photosensitive planographic printing plate |
JPH02867A (ja) * | 1987-11-26 | 1990-01-05 | Toshiba Corp | レジスト |
JPH02502312A (ja) * | 1987-12-10 | 1990-07-26 | マクダーミツド インコーポレーテツド | 像反転性乾燥フィルムホトレジスト |
Also Published As
Publication number | Publication date |
---|---|
JPS5241050B2 (enrdf_load_stackoverflow) | 1977-10-15 |