JPS6159656B2 - - Google Patents

Info

Publication number
JPS6159656B2
JPS6159656B2 JP54020431A JP2043179A JPS6159656B2 JP S6159656 B2 JPS6159656 B2 JP S6159656B2 JP 54020431 A JP54020431 A JP 54020431A JP 2043179 A JP2043179 A JP 2043179A JP S6159656 B2 JPS6159656 B2 JP S6159656B2
Authority
JP
Japan
Prior art keywords
metal film
electrode
inp
alloy
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54020431A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55113369A (en
Inventor
Masaki Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP2043179A priority Critical patent/JPS55113369A/ja
Publication of JPS55113369A publication Critical patent/JPS55113369A/ja
Publication of JPS6159656B2 publication Critical patent/JPS6159656B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
JP2043179A 1979-02-22 1979-02-22 Ohmic electrode and its manufacture Granted JPS55113369A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2043179A JPS55113369A (en) 1979-02-22 1979-02-22 Ohmic electrode and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2043179A JPS55113369A (en) 1979-02-22 1979-02-22 Ohmic electrode and its manufacture

Publications (2)

Publication Number Publication Date
JPS55113369A JPS55113369A (en) 1980-09-01
JPS6159656B2 true JPS6159656B2 (enrdf_load_stackoverflow) 1986-12-17

Family

ID=12026845

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2043179A Granted JPS55113369A (en) 1979-02-22 1979-02-22 Ohmic electrode and its manufacture

Country Status (1)

Country Link
JP (1) JPS55113369A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0658954B2 (ja) * 1986-01-21 1994-08-03 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション ▲iii▼―v族化合物半導体デバイス及びその形成方法
JP7653078B2 (ja) * 2021-07-06 2025-03-28 ウシオ電機株式会社 赤外led素子

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51146180A (en) * 1975-06-11 1976-12-15 Mitsubishi Electric Corp Iii-v family compound semi-conductor electric pole formation

Also Published As

Publication number Publication date
JPS55113369A (en) 1980-09-01

Similar Documents

Publication Publication Date Title
KR900006486B1 (ko) 박막배선층을 갖는 반도체장치 및 그의 박막배선층 형성방법
US4011583A (en) Ohmics contacts of germanium and palladium alloy from group III-V n-type semiconductors
KR100351195B1 (ko) 화합물반도체의오믹콘택트제조방법
JPS5932055B2 (ja) 接点を有する半導体装置の製造方法
JPS6016096B2 (ja) 半導体装置の製造法
JP2907452B2 (ja) 化合物半導体用電極
US3525146A (en) Method of making semiconductor devices having crystal extensions for leads
US5187560A (en) Ohmic electrode for n-type cubic boron nitride and the process for manufacturing the same
JPS6159656B2 (enrdf_load_stackoverflow)
EP0424857B1 (en) Process for producing ohmic electrode for p-type cubic system boron nitride
FR2459551A1 (fr) Procede et structure de passivation a autoalignement sur l'emplacement d'un masque
US3515583A (en) Method for manufacturing semiconductor devices
JPS6138849B2 (enrdf_load_stackoverflow)
US5240877A (en) Process for manufacturing an ohmic electrode for n-type cubic boron nitride
JPS637624A (ja) 3−v族化合物半導体材料中への導電形付与物質の拡散方法
EP0625801B1 (en) Process for fabricating an ohmic electrode
JPS6148776B2 (enrdf_load_stackoverflow)
JP3267480B2 (ja) 化合物半導体の製造方法及び化合物半導体のオーム性電極の形成方法
JP3698528B2 (ja) 炭化ケイ素−金属複合体とその製造方法
JPH0224030B2 (enrdf_load_stackoverflow)
JP2827862B2 (ja) 化合物半導体のオーム性電極及びその形成方法
JPS6349393B2 (enrdf_load_stackoverflow)
JPH0226790B2 (enrdf_load_stackoverflow)
JPS63253633A (ja) 半導体装置の製造方法
JPH02170417A (ja) 化合物半導体装置の電極の製造方法