JPS6159536B2 - - Google Patents

Info

Publication number
JPS6159536B2
JPS6159536B2 JP54007127A JP712779A JPS6159536B2 JP S6159536 B2 JPS6159536 B2 JP S6159536B2 JP 54007127 A JP54007127 A JP 54007127A JP 712779 A JP712779 A JP 712779A JP S6159536 B2 JPS6159536 B2 JP S6159536B2
Authority
JP
Japan
Prior art keywords
collector
base
iil
emitter
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54007127A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5599767A (en
Inventor
Yasushi Hatsuta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP712779A priority Critical patent/JPS5599767A/ja
Publication of JPS5599767A publication Critical patent/JPS5599767A/ja
Publication of JPS6159536B2 publication Critical patent/JPS6159536B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/65Integrated injection logic

Landscapes

  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)
JP712779A 1979-01-26 1979-01-26 Iil type semiconductor device Granted JPS5599767A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP712779A JPS5599767A (en) 1979-01-26 1979-01-26 Iil type semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP712779A JPS5599767A (en) 1979-01-26 1979-01-26 Iil type semiconductor device

Publications (2)

Publication Number Publication Date
JPS5599767A JPS5599767A (en) 1980-07-30
JPS6159536B2 true JPS6159536B2 (enrdf_load_stackoverflow) 1986-12-17

Family

ID=11657406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP712779A Granted JPS5599767A (en) 1979-01-26 1979-01-26 Iil type semiconductor device

Country Status (1)

Country Link
JP (1) JPS5599767A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210011861A (ko) 2019-07-23 2021-02-02 가부시키가이샤 코쿠사이 엘렉트릭 반도체 장치의 제조 방법, 기판 처리 장치 및 기록 매체

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210011861A (ko) 2019-07-23 2021-02-02 가부시키가이샤 코쿠사이 엘렉트릭 반도체 장치의 제조 방법, 기판 처리 장치 및 기록 매체

Also Published As

Publication number Publication date
JPS5599767A (en) 1980-07-30

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