JPS6159334A - 有機溶媒可溶性の感光性ポリイミド組成物 - Google Patents

有機溶媒可溶性の感光性ポリイミド組成物

Info

Publication number
JPS6159334A
JPS6159334A JP18156884A JP18156884A JPS6159334A JP S6159334 A JPS6159334 A JP S6159334A JP 18156884 A JP18156884 A JP 18156884A JP 18156884 A JP18156884 A JP 18156884A JP S6159334 A JPS6159334 A JP S6159334A
Authority
JP
Japan
Prior art keywords
photosensitive polyimide
polyimide
organic solvent
aromatic
compound represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18156884A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0531132B2 (enrdf_load_stackoverflow
Inventor
Kohei Nakajima
中島　紘平
Kazuaki Nishio
一章 西尾
Toshiya Koyama
俊哉 小山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP18156884A priority Critical patent/JPS6159334A/ja
Publication of JPS6159334A publication Critical patent/JPS6159334A/ja
Publication of JPH0531132B2 publication Critical patent/JPH0531132B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP18156884A 1984-08-30 1984-08-30 有機溶媒可溶性の感光性ポリイミド組成物 Granted JPS6159334A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18156884A JPS6159334A (ja) 1984-08-30 1984-08-30 有機溶媒可溶性の感光性ポリイミド組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18156884A JPS6159334A (ja) 1984-08-30 1984-08-30 有機溶媒可溶性の感光性ポリイミド組成物

Publications (2)

Publication Number Publication Date
JPS6159334A true JPS6159334A (ja) 1986-03-26
JPH0531132B2 JPH0531132B2 (enrdf_load_stackoverflow) 1993-05-11

Family

ID=16103075

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18156884A Granted JPS6159334A (ja) 1984-08-30 1984-08-30 有機溶媒可溶性の感光性ポリイミド組成物

Country Status (1)

Country Link
JP (1) JPS6159334A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6315847A (ja) * 1986-07-05 1988-01-22 Asahi Chem Ind Co Ltd 感光性ポリイミド組成物
US6001534A (en) * 1997-03-31 1999-12-14 Shin-Etsu Chemical Co., Ltd. Photosensitive resin composition
US8057700B2 (en) 2007-12-07 2011-11-15 Cheil Industries, Inc. Liquid crystal photo-alignment agent and liquid crystal photo-alignment film and liquid crystal display including the same
US8425799B2 (en) 2007-10-10 2013-04-23 Cheil Industries Inc. Photoalignment agent of liquid crystal, photoalignment film of liquid crystal including the same, and liquid crystal display including the same
US8487069B2 (en) 2009-12-16 2013-07-16 Cheil Industries Inc. Liquid crystal photo-alignment agent, liquid crystal photo-alignment layer manufactured using the same, and liquid crystal display device including the liquid crystal photo-alignment layer
US8623515B2 (en) 2010-12-29 2014-01-07 Cheil Industries Inc. Liquid crystal alignment agent, liquid crystal alignment film manufactured using the same, and liquid crystal display device including the liquid crystal alignment film
US8722158B2 (en) 2008-12-12 2014-05-13 Cheil Industries Inc. Liquid crystal photo-alignment agent and liquid crystal photo-alignment film manufactured using the same
US8969486B2 (en) 2011-12-19 2015-03-03 Cheil Industries Inc. Liquid crystal alignment agent, liquid crystal alignment film using the same, and liquid crystal display device including the liquid crystal alignment film

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5545747A (en) * 1978-09-29 1980-03-31 Hitachi Ltd Photosensitive polymer and its production
JPS5638039A (en) * 1979-09-05 1981-04-13 Fujitsu Ltd Positive type resist

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5545747A (en) * 1978-09-29 1980-03-31 Hitachi Ltd Photosensitive polymer and its production
JPS5638039A (en) * 1979-09-05 1981-04-13 Fujitsu Ltd Positive type resist

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6315847A (ja) * 1986-07-05 1988-01-22 Asahi Chem Ind Co Ltd 感光性ポリイミド組成物
US6001534A (en) * 1997-03-31 1999-12-14 Shin-Etsu Chemical Co., Ltd. Photosensitive resin composition
US8425799B2 (en) 2007-10-10 2013-04-23 Cheil Industries Inc. Photoalignment agent of liquid crystal, photoalignment film of liquid crystal including the same, and liquid crystal display including the same
US8057700B2 (en) 2007-12-07 2011-11-15 Cheil Industries, Inc. Liquid crystal photo-alignment agent and liquid crystal photo-alignment film and liquid crystal display including the same
US8722158B2 (en) 2008-12-12 2014-05-13 Cheil Industries Inc. Liquid crystal photo-alignment agent and liquid crystal photo-alignment film manufactured using the same
US8487069B2 (en) 2009-12-16 2013-07-16 Cheil Industries Inc. Liquid crystal photo-alignment agent, liquid crystal photo-alignment layer manufactured using the same, and liquid crystal display device including the liquid crystal photo-alignment layer
US8623515B2 (en) 2010-12-29 2014-01-07 Cheil Industries Inc. Liquid crystal alignment agent, liquid crystal alignment film manufactured using the same, and liquid crystal display device including the liquid crystal alignment film
US8969486B2 (en) 2011-12-19 2015-03-03 Cheil Industries Inc. Liquid crystal alignment agent, liquid crystal alignment film using the same, and liquid crystal display device including the liquid crystal alignment film

Also Published As

Publication number Publication date
JPH0531132B2 (enrdf_load_stackoverflow) 1993-05-11

Similar Documents

Publication Publication Date Title
US4595745A (en) Organic solvent-soluble photosensitive polyamide resin
EP0138768B1 (de) Strahlungsempfindliche Polykondensate, Verfahren zu deren Herstellung, beschichtetes Material und dessen Verwendung
JPS59220729A (ja) 有機溶媒可溶性の感光性ポリイミド
US4540650A (en) Photoresists suitable for forming relief structures of highly heat-resistant polymers
JPS6072925A (ja) 有機溶媒可溶性の感光性ポリイミド
JPS59108031A (ja) 感光性ポリイミド
JP3332278B2 (ja) ポリイミド前駆体およびネガ型感光性材料、並びに感光性基材およびネガ型パターン形成方法
DE3850459T2 (de) Lichtempfindliche Zusammensetzungen.
JPS6157620A (ja) 有機溶媒可溶性の感光性ポリイミド
JPS6159334A (ja) 有機溶媒可溶性の感光性ポリイミド組成物
JPS59232122A (ja) 有機溶媒可溶性の感光性ポリイミド
JPS606729A (ja) 有機溶媒に可溶性の感光性ポリイミド
WO1998004959A1 (fr) Compositions de resine negative et leur application
JPS59220730A (ja) 溶媒可溶性の感光性ポリイミド
US4316974A (en) Polymers for use in heat resistant photoresist composition and process for preparing the same
JPS6042425A (ja) 化学線感応性重合体組成物
JPS61254605A (ja) 感光性組成物
JPH04313756A (ja) 感光材及びその製造方法
JP3990906B2 (ja) 新規感光性樹脂組成物およびそれを用いたパターンの製造方法
JPS61238809A (ja) 感光性ポリイミドの樹脂液組成物
JPS60178446A (ja) 有機溶媒可溶性の感光材料
JPS606725A (ja) 有機溶媒可溶性の感光性ポリアミド
JPS6116970B2 (enrdf_load_stackoverflow)
JPS606728A (ja) 有機溶媒可溶性の感光性ポリアミドイミド
JPS59219255A (ja) 新規な芳香族ジアミン化合物

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term