JPS6157946A - アモルフアスシリコン感光体製造用装置 - Google Patents

アモルフアスシリコン感光体製造用装置

Info

Publication number
JPS6157946A
JPS6157946A JP59179908A JP17990884A JPS6157946A JP S6157946 A JPS6157946 A JP S6157946A JP 59179908 A JP59179908 A JP 59179908A JP 17990884 A JP17990884 A JP 17990884A JP S6157946 A JPS6157946 A JP S6157946A
Authority
JP
Japan
Prior art keywords
reaction tank
cylindrical
electrode
outside
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59179908A
Other languages
English (en)
Japanese (ja)
Other versions
JPH029672B2 (OSRAM
Inventor
Noboru Ebara
江原　襄
Toshiro Matsuyama
松山　外志郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP59179908A priority Critical patent/JPS6157946A/ja
Publication of JPS6157946A publication Critical patent/JPS6157946A/ja
Publication of JPH029672B2 publication Critical patent/JPH029672B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G03G5/08214—Silicon-based
    • G03G5/08278—Depositing methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Light Receiving Elements (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)
JP59179908A 1984-08-29 1984-08-29 アモルフアスシリコン感光体製造用装置 Granted JPS6157946A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59179908A JPS6157946A (ja) 1984-08-29 1984-08-29 アモルフアスシリコン感光体製造用装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59179908A JPS6157946A (ja) 1984-08-29 1984-08-29 アモルフアスシリコン感光体製造用装置

Publications (2)

Publication Number Publication Date
JPS6157946A true JPS6157946A (ja) 1986-03-25
JPH029672B2 JPH029672B2 (OSRAM) 1990-03-02

Family

ID=16074010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59179908A Granted JPS6157946A (ja) 1984-08-29 1984-08-29 アモルフアスシリコン感光体製造用装置

Country Status (1)

Country Link
JP (1) JPS6157946A (OSRAM)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51112263A (en) * 1975-03-28 1976-10-04 Hitachi Ltd Semiconductor surface processor base
JPS5546056A (en) * 1978-09-29 1980-03-31 Hitachi Ltd Electronic fuel injection device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51112263A (en) * 1975-03-28 1976-10-04 Hitachi Ltd Semiconductor surface processor base
JPS5546056A (en) * 1978-09-29 1980-03-31 Hitachi Ltd Electronic fuel injection device

Also Published As

Publication number Publication date
JPH029672B2 (OSRAM) 1990-03-02

Similar Documents

Publication Publication Date Title
JPH04264715A (ja) 縦型バッチ処理装置
JPS61110768A (ja) アモルフアスシリコン感光体製造用装置
JP2018527749A (ja) 基板処理装置及び基板処理方法
JPS6157946A (ja) アモルフアスシリコン感光体製造用装置
JPH0428860A (ja) イオンプレーティング装置用回転テーブル
US4418645A (en) Glow discharge apparatus with squirrel cage electrode
JPH029673B2 (OSRAM)
JPH0338586B2 (OSRAM)
JPS6353854B2 (OSRAM)
JPS6043488A (ja) 薄膜製造装置
JPS59213439A (ja) 容量結合型グロ−放電分解装置
JPS59217614A (ja) アモルフアスシリコン成膜装置
JPH02184022A (ja) Ｃｖｄ電極
JP2958850B2 (ja) プラズマｃｖｄ装置およびそれを用いるアモルファスシリコン感光体の製造方法
JP2920637B2 (ja) グロー放電分解装置
JPS5990631A (ja) プラズマｃｖｄ装置
JPH1027761A (ja) 化学反応装置
JPH0545672B2 (OSRAM)
JPS5871369A (ja) 感光体の製造装置
JPH0549751B2 (OSRAM)
JPH01133318A (ja) 薄膜処理装置
CN111235553B (zh) 一种一体化电极及在等离子体增强化学气相沉积设备中的应用
JPH0532472B2 (OSRAM)
JPS60127731A (ja) プラズマエツチング装置
JPH01177371A (ja) 非晶質ケイ素感光体製造用横型プラズマｃｖｄ装置