JPS6157231A - 真空装置 - Google Patents

真空装置

Info

Publication number
JPS6157231A
JPS6157231A JP15662184A JP15662184A JPS6157231A JP S6157231 A JPS6157231 A JP S6157231A JP 15662184 A JP15662184 A JP 15662184A JP 15662184 A JP15662184 A JP 15662184A JP S6157231 A JPS6157231 A JP S6157231A
Authority
JP
Japan
Prior art keywords
vacuum
valve body
cam
gate valve
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15662184A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6322174B2 (enExample
Inventor
Taku Yoshida
卓 吉田
Toshimasa Kisa
木佐　俊正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15662184A priority Critical patent/JPS6157231A/ja
Publication of JPS6157231A publication Critical patent/JPS6157231A/ja
Publication of JPS6322174B2 publication Critical patent/JPS6322174B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP15662184A 1984-07-27 1984-07-27 真空装置 Granted JPS6157231A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15662184A JPS6157231A (ja) 1984-07-27 1984-07-27 真空装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15662184A JPS6157231A (ja) 1984-07-27 1984-07-27 真空装置

Publications (2)

Publication Number Publication Date
JPS6157231A true JPS6157231A (ja) 1986-03-24
JPS6322174B2 JPS6322174B2 (enExample) 1988-05-11

Family

ID=15631713

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15662184A Granted JPS6157231A (ja) 1984-07-27 1984-07-27 真空装置

Country Status (1)

Country Link
JP (1) JPS6157231A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04129706U (ja) * 1991-05-17 1992-11-27 三陽機器株式会社 農用トラクタのフロントローダ連結支持装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04129706U (ja) * 1991-05-17 1992-11-27 三陽機器株式会社 農用トラクタのフロントローダ連結支持装置

Also Published As

Publication number Publication date
JPS6322174B2 (enExample) 1988-05-11

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