JPS615598A - リードピン等を浄化する方法 - Google Patents
リードピン等を浄化する方法Info
- Publication number
- JPS615598A JPS615598A JP60044517A JP4451785A JPS615598A JP S615598 A JPS615598 A JP S615598A JP 60044517 A JP60044517 A JP 60044517A JP 4451785 A JP4451785 A JP 4451785A JP S615598 A JPS615598 A JP S615598A
- Authority
- JP
- Japan
- Prior art keywords
- lead
- cathode
- cleaning
- cleaned
- lead frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/04—Mounting of components, e.g. of leadless components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/20—Preliminary treatment of work or areas to be soldered, e.g. in respect of a galvanic coating
- B23K1/206—Cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K3/00—Tools, devices, or special appurtenances for soldering, e.g. brazing, or unsoldering, not specially adapted for particular methods
- B23K3/08—Auxiliary devices therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
- H01L21/4814—Conductive parts
- H01L21/4821—Flat leads, e.g. lead frames with or without insulating supports
- H01L21/4835—Cleaning, e.g. removing of solder
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Analytical Chemistry (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Lead Frames For Integrated Circuits (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- ing And Chemical Polishing (AREA)
- Cleaning In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US58684184A | 1984-03-06 | 1984-03-06 | |
| US586841 | 1984-03-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS615598A true JPS615598A (ja) | 1986-01-11 |
| JPH0262959B2 JPH0262959B2 (OSRAM) | 1990-12-27 |
Family
ID=24347305
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60044517A Granted JPS615598A (ja) | 1984-03-06 | 1985-03-06 | リードピン等を浄化する方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS615598A (OSRAM) |
| DE (1) | DE3508005A1 (OSRAM) |
| GB (1) | GB2159753B (OSRAM) |
| NL (1) | NL8500637A (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014511768A (ja) * | 2011-04-08 | 2014-05-19 | リンカーン グローバル,インコーポレイテッド | 目標ガス量を調整する手段を有するろう付けシステム、許容可能ガス比の設定を有するろう付け方法 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4032328A1 (de) * | 1989-11-06 | 1991-09-19 | Wls Karl Heinz Grasmann Weichl | Verfahren und vorrichtung zur verarbeitung von zu verloetenden fuegepartnern |
| FR2661544B1 (fr) * | 1990-04-27 | 1994-05-27 | Commissariat Energie Atomique | Procede et dispositif de decontamination par decapage ionique. |
| US5223691A (en) * | 1991-06-03 | 1993-06-29 | Motorola, Inc. | Plasma based soldering method requiring no additional heat sources or flux |
| DE19654250A1 (de) * | 1996-08-26 | 1998-03-05 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zum Herstellen oxidationsempfindlicher Lötverbindunden |
| US6468833B2 (en) * | 2000-03-31 | 2002-10-22 | American Air Liquide, Inc. | Systems and methods for application of substantially dry atmospheric plasma surface treatment to various electronic component packaging and assembly methods |
| CN108511329B (zh) * | 2018-06-15 | 2024-03-15 | 德阳帛汉电子有限公司 | 一种芯片清洗装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50149562A (OSRAM) * | 1974-05-23 | 1975-11-29 | ||
| JPS54124853A (en) * | 1978-03-23 | 1979-09-28 | Hiroyasu Funakubo | Press contacting method and apparatus of minute metal strain |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB806381A (en) * | 1956-07-27 | 1958-12-23 | Gen Motors Corp | Improvements in or relating to methods of, and apparatus for, etching metal surfaces by ionic bombardment and to articles produced thereby |
| DE1289382B (de) * | 1963-08-16 | 1969-02-13 | Licentia Gmbh | Verfahren zur Oxydation eines Silizium-Halbleiterkoerpers |
| BE758321A (fr) * | 1969-11-03 | 1971-04-01 | Rca Corp | Procede de metallisation de dispositifs a semi-conducteurs |
| GB1305313A (OSRAM) * | 1970-02-13 | 1973-01-31 | ||
| FR2082505A5 (OSRAM) * | 1970-03-18 | 1971-12-10 | Radiotechnique Compelec | |
| GB1347849A (en) * | 1971-04-21 | 1974-02-27 | Nat Res Dev | Metal oxide semiconductor transistors |
| GB1462929A (en) * | 1974-09-03 | 1977-01-26 | Olson D M | Vaginal speculum |
| US3994793A (en) * | 1975-05-22 | 1976-11-30 | International Business Machines Corporation | Reactive ion etching of aluminum |
| GB2144669B (en) * | 1982-12-07 | 1986-02-26 | Standard Telephones Cables Ltd | Cleaning electrical contacts |
-
1985
- 1985-03-05 GB GB08505650A patent/GB2159753B/en not_active Expired
- 1985-03-06 NL NL8500637A patent/NL8500637A/nl not_active Application Discontinuation
- 1985-03-06 DE DE19853508005 patent/DE3508005A1/de not_active Withdrawn
- 1985-03-06 JP JP60044517A patent/JPS615598A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50149562A (OSRAM) * | 1974-05-23 | 1975-11-29 | ||
| JPS54124853A (en) * | 1978-03-23 | 1979-09-28 | Hiroyasu Funakubo | Press contacting method and apparatus of minute metal strain |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014511768A (ja) * | 2011-04-08 | 2014-05-19 | リンカーン グローバル,インコーポレイテッド | 目標ガス量を調整する手段を有するろう付けシステム、許容可能ガス比の設定を有するろう付け方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0262959B2 (OSRAM) | 1990-12-27 |
| GB2159753A (en) | 1985-12-11 |
| DE3508005A1 (de) | 1986-03-27 |
| NL8500637A (nl) | 1985-10-01 |
| GB8505650D0 (en) | 1985-04-03 |
| GB2159753B (en) | 1988-09-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS616285A (ja) | 逆スパツタリングによつて型を浄化する方法及び装置 | |
| EP0546443B1 (en) | Soldering by conduction of heat from a plasma | |
| JP3312377B2 (ja) | ろう材による接合方法及び装置 | |
| US4012307A (en) | Method for conditioning drilled holes in multilayer wiring boards | |
| US20020134403A1 (en) | Combined plasma/liquid cleaning of substrates | |
| JP2001007095A (ja) | 表面処理方法及びその装置、半導体装置の製造方法及びその装置、並びに液晶ディスプレイの製造方法 | |
| JPS615598A (ja) | リードピン等を浄化する方法 | |
| DE60214159T2 (de) | Methode zur entfernung von oxiden auf kupferanschlussflächen | |
| CN108511316A (zh) | 半导体晶片的清洗方法 | |
| US5786073A (en) | Integrated circuit comprising solder bumps | |
| US6524965B2 (en) | Cleaning method for semiconductor manufacturing process to prevent metal corrosion | |
| US6632288B2 (en) | Method for cleaning copper surfaces | |
| KR100433961B1 (ko) | 반도체 기판용 세정 수용액 | |
| KR101264460B1 (ko) | 가공물의 표면으로부터 이온 오염물을 제거하기 위한 수용액 및 방법 | |
| JP3557682B2 (ja) | 半導体装置の製造方法及びその装置、並びに液晶ディスプレイの製造方法 | |
| CN214666134U (zh) | 一种冷凝设备及冷凝装置 | |
| JP3070379B2 (ja) | 洗浄システム | |
| EP0574858A1 (en) | Inorganic oxidant compositions for removing contaminants | |
| JPH10107062A (ja) | プラズマクリーニング装置、プラズマクリーニング方法及び回路モジュールの製造方法 | |
| CN113560231A (zh) | 微小封装电子元件的pcba板的清洗方法 | |
| CN112170352A (zh) | 一种系统封装产品在线式清洗装置及清洗工艺 | |
| FR2560797A1 (fr) | Procede et appareil pour le nettoyage par pulverisation inverse sous vide des fiches de connexion et similaires avant des operations de soudage | |
| CN116092959A (zh) | 一种高效批量去除bga不良焊球的返工方法 | |
| KR100203751B1 (ko) | 반도체장치의 제조방법 | |
| JPH08103741A (ja) | 電子部品搭載用基板の洗浄方法 |