JPS6153431B2 - - Google Patents
Info
- Publication number
- JPS6153431B2 JPS6153431B2 JP15148783A JP15148783A JPS6153431B2 JP S6153431 B2 JPS6153431 B2 JP S6153431B2 JP 15148783 A JP15148783 A JP 15148783A JP 15148783 A JP15148783 A JP 15148783A JP S6153431 B2 JPS6153431 B2 JP S6153431B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- deposition chamber
- base
- substrate
- shielding member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 36
- 230000008021 deposition Effects 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 239000002994 raw material Substances 0.000 claims description 7
- 239000007789 gas Substances 0.000 description 21
- 239000010408 film Substances 0.000 description 14
- 108091008695 photoreceptors Proteins 0.000 description 6
- 229910021417 amorphous silicon Inorganic materials 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000002981 blocking agent Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5093—Coaxial electrodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15148783A JPS6043488A (ja) | 1983-08-22 | 1983-08-22 | 薄膜製造装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15148783A JPS6043488A (ja) | 1983-08-22 | 1983-08-22 | 薄膜製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6043488A JPS6043488A (ja) | 1985-03-08 |
| JPS6153431B2 true JPS6153431B2 (nl) | 1986-11-18 |
Family
ID=15519570
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15148783A Granted JPS6043488A (ja) | 1983-08-22 | 1983-08-22 | 薄膜製造装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6043488A (nl) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63136125U (nl) * | 1987-02-27 | 1988-09-07 | ||
| JPS63136127U (nl) * | 1987-02-27 | 1988-09-07 | ||
| JPH0430261Y2 (nl) * | 1987-02-27 | 1992-07-22 | ||
| JPH0685829U (ja) * | 1993-05-26 | 1994-12-13 | 積水化学工業株式会社 | 自在ドレン |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106622824B (zh) | 2016-11-30 | 2018-10-12 | 江苏菲沃泰纳米科技有限公司 | 一种等离子体聚合涂层装置 |
| US11339477B2 (en) | 2016-11-30 | 2022-05-24 | Jiangsu Favored Nanotechnology Co., LTD | Plasma polymerization coating apparatus and process |
| CN106756888B (zh) | 2016-11-30 | 2018-07-13 | 江苏菲沃泰纳米科技有限公司 | 一种纳米镀膜设备旋转货架装置 |
-
1983
- 1983-08-22 JP JP15148783A patent/JPS6043488A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63136125U (nl) * | 1987-02-27 | 1988-09-07 | ||
| JPS63136127U (nl) * | 1987-02-27 | 1988-09-07 | ||
| JPH0430261Y2 (nl) * | 1987-02-27 | 1992-07-22 | ||
| JPH0685829U (ja) * | 1993-05-26 | 1994-12-13 | 積水化学工業株式会社 | 自在ドレン |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6043488A (ja) | 1985-03-08 |
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