JPS6152565B2 - - Google Patents
Info
- Publication number
- JPS6152565B2 JPS6152565B2 JP54072654A JP7265479A JPS6152565B2 JP S6152565 B2 JPS6152565 B2 JP S6152565B2 JP 54072654 A JP54072654 A JP 54072654A JP 7265479 A JP7265479 A JP 7265479A JP S6152565 B2 JPS6152565 B2 JP S6152565B2
- Authority
- JP
- Japan
- Prior art keywords
- boron
- substrate
- impurity
- diffusion
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/14—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase
- H10P32/1404—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase using predeposition followed by drive-in of impurities into the semiconductor surface, e.g. predeposition from a gaseous phase
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/17—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
- H10P32/171—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being group IV material
Landscapes
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7265479A JPS55165627A (en) | 1979-06-09 | 1979-06-09 | Method for diffusing impurity into semiconductor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7265479A JPS55165627A (en) | 1979-06-09 | 1979-06-09 | Method for diffusing impurity into semiconductor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55165627A JPS55165627A (en) | 1980-12-24 |
| JPS6152565B2 true JPS6152565B2 (https=) | 1986-11-13 |
Family
ID=13495576
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7265479A Granted JPS55165627A (en) | 1979-06-09 | 1979-06-09 | Method for diffusing impurity into semiconductor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55165627A (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013168564A (ja) * | 2012-02-16 | 2013-08-29 | Ngk Insulators Ltd | 半導体装置及びその製造方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4840805A (https=) * | 1971-09-23 | 1973-06-15 | ||
| CS164401B1 (en) * | 1971-10-07 | 1975-11-07 | Jiri Beranek | Method of 1-beta-d-arabinofuranosylcytosine's preparation |
| JPS5620689B2 (https=) * | 1972-11-14 | 1981-05-15 |
-
1979
- 1979-06-09 JP JP7265479A patent/JPS55165627A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55165627A (en) | 1980-12-24 |
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