JPS6148421A - 高純度シリカおよびその製法 - Google Patents

高純度シリカおよびその製法

Info

Publication number
JPS6148421A
JPS6148421A JP17036884A JP17036884A JPS6148421A JP S6148421 A JPS6148421 A JP S6148421A JP 17036884 A JP17036884 A JP 17036884A JP 17036884 A JP17036884 A JP 17036884A JP S6148421 A JPS6148421 A JP S6148421A
Authority
JP
Japan
Prior art keywords
silica
reaction
content
less
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17036884A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0124729B2 (enExample
Inventor
Hiroyuki Kashiwase
弘之 柏瀬
Genichi Sato
源一 佐藤
Yutaka Konose
豊 木ノ瀬
Shozo Takatsu
高津　章造
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP17036884A priority Critical patent/JPS6148421A/ja
Publication of JPS6148421A publication Critical patent/JPS6148421A/ja
Publication of JPH0124729B2 publication Critical patent/JPH0124729B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Silicon Compounds (AREA)
JP17036884A 1984-08-17 1984-08-17 高純度シリカおよびその製法 Granted JPS6148421A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17036884A JPS6148421A (ja) 1984-08-17 1984-08-17 高純度シリカおよびその製法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17036884A JPS6148421A (ja) 1984-08-17 1984-08-17 高純度シリカおよびその製法

Publications (2)

Publication Number Publication Date
JPS6148421A true JPS6148421A (ja) 1986-03-10
JPH0124729B2 JPH0124729B2 (enExample) 1989-05-12

Family

ID=15903636

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17036884A Granted JPS6148421A (ja) 1984-08-17 1984-08-17 高純度シリカおよびその製法

Country Status (1)

Country Link
JP (1) JPS6148421A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104212203A (zh) * 2013-06-03 2014-12-17 富士施乐株式会社 二氧化硅复合颗粒及其制造方法
JP2019026494A (ja) * 2017-07-27 2019-02-21 太平洋セメント株式会社 シリカの製造方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54141569A (en) * 1978-04-26 1979-11-02 Toshiba Corp Semiconductor device
JPS554952A (en) * 1978-06-28 1980-01-14 Toshiba Corp Semiconductor device
JPS5610947A (en) * 1979-07-10 1981-02-03 Toshiba Corp Semiconductor sealing resin composition
JPS56116647A (en) * 1980-02-20 1981-09-12 Hitachi Ltd Manufacturing of silica-alumina type filler for semiconductor memory element covering resin
JPS57195151A (en) * 1981-05-27 1982-11-30 Denki Kagaku Kogyo Kk Low-radioactive resin composition
JPS57212224A (en) * 1981-06-24 1982-12-27 Nitto Electric Ind Co Ltd Epoxy resin composition for encapsulation of semiconductor
JPS5954632A (ja) * 1982-09-21 1984-03-29 Mitsubishi Metal Corp 石英ガラス粉末の製造法
JPS6421092A (en) * 1987-07-15 1989-01-24 Seiko Epson Corp Production of electroformed metal mold

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54141569A (en) * 1978-04-26 1979-11-02 Toshiba Corp Semiconductor device
JPS554952A (en) * 1978-06-28 1980-01-14 Toshiba Corp Semiconductor device
JPS5610947A (en) * 1979-07-10 1981-02-03 Toshiba Corp Semiconductor sealing resin composition
JPS56116647A (en) * 1980-02-20 1981-09-12 Hitachi Ltd Manufacturing of silica-alumina type filler for semiconductor memory element covering resin
JPS57195151A (en) * 1981-05-27 1982-11-30 Denki Kagaku Kogyo Kk Low-radioactive resin composition
JPS57212224A (en) * 1981-06-24 1982-12-27 Nitto Electric Ind Co Ltd Epoxy resin composition for encapsulation of semiconductor
JPS5954632A (ja) * 1982-09-21 1984-03-29 Mitsubishi Metal Corp 石英ガラス粉末の製造法
JPS6421092A (en) * 1987-07-15 1989-01-24 Seiko Epson Corp Production of electroformed metal mold

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104212203A (zh) * 2013-06-03 2014-12-17 富士施乐株式会社 二氧化硅复合颗粒及其制造方法
CN104212203B (zh) * 2013-06-03 2018-05-01 富士施乐株式会社 二氧化硅复合颗粒及其制造方法
JP2019026494A (ja) * 2017-07-27 2019-02-21 太平洋セメント株式会社 シリカの製造方法

Also Published As

Publication number Publication date
JPH0124729B2 (enExample) 1989-05-12

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