JPS614519A - 無機ガス分離膜の製造方法 - Google Patents
無機ガス分離膜の製造方法Info
- Publication number
- JPS614519A JPS614519A JP12191384A JP12191384A JPS614519A JP S614519 A JPS614519 A JP S614519A JP 12191384 A JP12191384 A JP 12191384A JP 12191384 A JP12191384 A JP 12191384A JP S614519 A JPS614519 A JP S614519A
- Authority
- JP
- Japan
- Prior art keywords
- inorganic
- porous body
- gas
- inorganic porous
- soln
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012528 membrane Substances 0.000 title claims abstract description 26
- 229910001872 inorganic gas Inorganic materials 0.000 title claims abstract description 15
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000011148 porous material Substances 0.000 claims abstract description 6
- 238000001035 drying Methods 0.000 claims abstract description 5
- 238000000926 separation method Methods 0.000 claims description 28
- 239000005373 porous glass Substances 0.000 claims description 7
- 238000010304 firing Methods 0.000 claims description 5
- 150000002902 organometallic compounds Chemical class 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 14
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical group [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 abstract description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract description 4
- 239000011521 glass Substances 0.000 abstract description 2
- 239000002994 raw material Substances 0.000 abstract description 2
- 238000001179 sorption measurement Methods 0.000 abstract description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 abstract 1
- 238000001354 calcination Methods 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 14
- 229910001873 dinitrogen Inorganic materials 0.000 description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- 239000001307 helium Substances 0.000 description 6
- 229910052734 helium Inorganic materials 0.000 description 6
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 239000012510 hollow fiber Substances 0.000 description 3
- 238000010306 acid treatment Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12191384A JPS614519A (ja) | 1984-06-15 | 1984-06-15 | 無機ガス分離膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12191384A JPS614519A (ja) | 1984-06-15 | 1984-06-15 | 無機ガス分離膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS614519A true JPS614519A (ja) | 1986-01-10 |
| JPS6351052B2 JPS6351052B2 (cg-RX-API-DMAC7.html) | 1988-10-12 |
Family
ID=14823009
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12191384A Granted JPS614519A (ja) | 1984-06-15 | 1984-06-15 | 無機ガス分離膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS614519A (cg-RX-API-DMAC7.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0484666U (cg-RX-API-DMAC7.html) * | 1990-11-30 | 1992-07-23 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5344580A (en) * | 1976-10-05 | 1978-04-21 | Mitsubishi Chem Ind Ltd | 1,6-dihydropyridazine derivatives |
| JPS5959224A (ja) * | 1982-09-28 | 1984-04-05 | Mitsubishi Heavy Ind Ltd | 多孔質隔膜の製造方法 |
-
1984
- 1984-06-15 JP JP12191384A patent/JPS614519A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5344580A (en) * | 1976-10-05 | 1978-04-21 | Mitsubishi Chem Ind Ltd | 1,6-dihydropyridazine derivatives |
| JPS5959224A (ja) * | 1982-09-28 | 1984-04-05 | Mitsubishi Heavy Ind Ltd | 多孔質隔膜の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6351052B2 (cg-RX-API-DMAC7.html) | 1988-10-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |