JPS6144715A - 合成モルデナイト成形体の製造法 - Google Patents
合成モルデナイト成形体の製造法Info
- Publication number
- JPS6144715A JPS6144715A JP16488884A JP16488884A JPS6144715A JP S6144715 A JPS6144715 A JP S6144715A JP 16488884 A JP16488884 A JP 16488884A JP 16488884 A JP16488884 A JP 16488884A JP S6144715 A JPS6144715 A JP S6144715A
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- molded body
- source
- firing
- molded
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Silicates, Zeolites, And Molecular Sieves (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16488884A JPS6144715A (ja) | 1984-08-08 | 1984-08-08 | 合成モルデナイト成形体の製造法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16488884A JPS6144715A (ja) | 1984-08-08 | 1984-08-08 | 合成モルデナイト成形体の製造法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6144715A true JPS6144715A (ja) | 1986-03-04 |
| JPH055769B2 JPH055769B2 (enExample) | 1993-01-25 |
Family
ID=15801785
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16488884A Granted JPS6144715A (ja) | 1984-08-08 | 1984-08-08 | 合成モルデナイト成形体の製造法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6144715A (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6445585U (enExample) * | 1987-09-17 | 1989-03-20 | ||
| US4921778A (en) * | 1988-07-29 | 1990-05-01 | Shipley Company Inc. | Photoresist pattern fabrication employing chemically amplified metalized material |
| US5079131A (en) * | 1988-08-29 | 1992-01-07 | Shipley Company Inc. | Method of forming positive images through organometallic treatment of negative acid hardening cross-linked photoresist formulations |
| JP2007520333A (ja) * | 2003-12-18 | 2007-07-26 | ズード−ケミー インコーポレイテッド | 一酸化炭素の変換用触媒 |
| CN118495548A (zh) * | 2024-05-20 | 2024-08-16 | 浙江大学 | 一种弱酸盐分子筛及其制备方法与应用 |
-
1984
- 1984-08-08 JP JP16488884A patent/JPS6144715A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6445585U (enExample) * | 1987-09-17 | 1989-03-20 | ||
| US4921778A (en) * | 1988-07-29 | 1990-05-01 | Shipley Company Inc. | Photoresist pattern fabrication employing chemically amplified metalized material |
| US5079131A (en) * | 1988-08-29 | 1992-01-07 | Shipley Company Inc. | Method of forming positive images through organometallic treatment of negative acid hardening cross-linked photoresist formulations |
| JP2007520333A (ja) * | 2003-12-18 | 2007-07-26 | ズード−ケミー インコーポレイテッド | 一酸化炭素の変換用触媒 |
| CN118495548A (zh) * | 2024-05-20 | 2024-08-16 | 浙江大学 | 一种弱酸盐分子筛及其制备方法与应用 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH055769B2 (enExample) | 1993-01-25 |
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