JPS6140772Y2 - - Google Patents
Info
- Publication number
- JPS6140772Y2 JPS6140772Y2 JP11682682U JP11682682U JPS6140772Y2 JP S6140772 Y2 JPS6140772 Y2 JP S6140772Y2 JP 11682682 U JP11682682 U JP 11682682U JP 11682682 U JP11682682 U JP 11682682U JP S6140772 Y2 JPS6140772 Y2 JP S6140772Y2
- Authority
- JP
- Japan
- Prior art keywords
- base material
- reduced pressure
- winding mechanism
- plasma
- exhaust gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 claims description 32
- 238000004804 winding Methods 0.000 claims description 20
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 3
- 238000007599 discharging Methods 0.000 claims description 2
- 239000002994 raw material Substances 0.000 description 11
- 238000004140 cleaning Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000006837 decompression Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11682682U JPS5921660U (ja) | 1982-07-31 | 1982-07-31 | プラズマｃｖｄ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11682682U JPS5921660U (ja) | 1982-07-31 | 1982-07-31 | プラズマｃｖｄ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5921660U JPS5921660U (ja) | 1984-02-09 |
| JPS6140772Y2 true JPS6140772Y2 (enrdf_load_stackoverflow) | 1986-11-20 |
Family
ID=30269160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11682682U Granted JPS5921660U (ja) | 1982-07-31 | 1982-07-31 | プラズマｃｖｄ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5921660U (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2520589B2 (ja) * | 1985-06-17 | 1996-07-31 | キヤノン株式会社 | Ｃｖｄ法による堆積膜形成方法 |
-
1982
- 1982-07-31 JP JP11682682U patent/JPS5921660U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5921660U (ja) | 1984-02-09 |
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