JPS6138913Y2 - - Google Patents
Info
- Publication number
- JPS6138913Y2 JPS6138913Y2 JP11612683U JP11612683U JPS6138913Y2 JP S6138913 Y2 JPS6138913 Y2 JP S6138913Y2 JP 11612683 U JP11612683 U JP 11612683U JP 11612683 U JP11612683 U JP 11612683U JP S6138913 Y2 JPS6138913 Y2 JP S6138913Y2
- Authority
- JP
- Japan
- Prior art keywords
- turntable
- wafer
- vapor phase
- phase growth
- growth apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001947 vapour-phase growth Methods 0.000 claims description 14
- 239000012495 reaction gas Substances 0.000 claims description 7
- 239000012212 insulator Substances 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 7
- 238000002347 injection Methods 0.000 description 6
- 239000007924 injection Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 3
- 239000012808 vapor phase Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11612683U JPS6025750U (ja) | 1983-07-25 | 1983-07-25 | 気相成長装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11612683U JPS6025750U (ja) | 1983-07-25 | 1983-07-25 | 気相成長装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6025750U JPS6025750U (ja) | 1985-02-21 |
| JPS6138913Y2 true JPS6138913Y2 (ko) | 1986-11-08 |
Family
ID=30267820
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11612683U Granted JPS6025750U (ja) | 1983-07-25 | 1983-07-25 | 気相成長装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6025750U (ko) |
-
1983
- 1983-07-25 JP JP11612683U patent/JPS6025750U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6025750U (ja) | 1985-02-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6138913Y2 (ko) | ||
| US5087341A (en) | Dry etching apparatus and method | |
| JPH05226258A (ja) | プラズマ発生装置 | |
| KR960008697A (ko) | 고주파 플라즈마 화학증착법을 이용한 원형기판용 코팅층의 대량 합성장치 및 합성방법 | |
| JPS60194077A (ja) | 堆積膜形成装置 | |
| JPS57202733A (en) | Dry etching device | |
| JPS61177374A (ja) | プラズマｃｖｄ装置及びプラズマｃｖｄによる成膜方法 | |
| JPS6413119U (ko) | ||
| JPS60196931A (ja) | 堆積膜形成装置 | |
| JPS6250470A (ja) | プラズマｃｖｄ装置 | |
| JPS6323826B2 (ko) | ||
| JPS61188352U (ko) | ||
| JPS6346465U (ko) | ||
| JPS62191867U (ko) | ||
| JPS6250471A (ja) | プラズマｃｖｄ装置 | |
| JPH06101458B2 (ja) | プラズマ気相成長装置 | |
| JPS62107439U (ko) | ||
| JPS6228875U (ko) | ||
| JPH0247030U (ko) | ||
| JPS62180933U (ko) | ||
| JPS57184213A (en) | Vapor growth device for semiconductor | |
| JPS64470B2 (ko) | ||
| JPS63153526U (ko) | ||
| JPH0231126U (ko) | ||
| JPH0334062U (ko) |