JPS6136221B2 - - Google Patents

Info

Publication number
JPS6136221B2
JPS6136221B2 JP4274079A JP4274079A JPS6136221B2 JP S6136221 B2 JPS6136221 B2 JP S6136221B2 JP 4274079 A JP4274079 A JP 4274079A JP 4274079 A JP4274079 A JP 4274079A JP S6136221 B2 JPS6136221 B2 JP S6136221B2
Authority
JP
Japan
Prior art keywords
dry plate
lid
mask
cleaning device
nozzle assembly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4274079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55134851A (en
Inventor
Takao Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4274079A priority Critical patent/JPS55134851A/ja
Publication of JPS55134851A publication Critical patent/JPS55134851A/ja
Publication of JPS6136221B2 publication Critical patent/JPS6136221B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP4274079A 1979-04-09 1979-04-09 Mask purifier Granted JPS55134851A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4274079A JPS55134851A (en) 1979-04-09 1979-04-09 Mask purifier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4274079A JPS55134851A (en) 1979-04-09 1979-04-09 Mask purifier

Publications (2)

Publication Number Publication Date
JPS55134851A JPS55134851A (en) 1980-10-21
JPS6136221B2 true JPS6136221B2 (enrdf_load_stackoverflow) 1986-08-16

Family

ID=12644412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4274079A Granted JPS55134851A (en) 1979-04-09 1979-04-09 Mask purifier

Country Status (1)

Country Link
JP (1) JPS55134851A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60231330A (ja) * 1984-04-28 1985-11-16 Seiichiro Sogo 半導体材料の処理装置
JPS61170034A (ja) * 1985-01-23 1986-07-31 Hitachi Ltd 洗浄装置
JP4658776B2 (ja) * 2005-11-01 2011-03-23 株式会社リコー 洗浄装置

Also Published As

Publication number Publication date
JPS55134851A (en) 1980-10-21

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