JPS6135710B2 - - Google Patents

Info

Publication number
JPS6135710B2
JPS6135710B2 JP53017155A JP1715578A JPS6135710B2 JP S6135710 B2 JPS6135710 B2 JP S6135710B2 JP 53017155 A JP53017155 A JP 53017155A JP 1715578 A JP1715578 A JP 1715578A JP S6135710 B2 JPS6135710 B2 JP S6135710B2
Authority
JP
Japan
Prior art keywords
insulating film
gate electrode
forming
substrate
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53017155A
Other languages
English (en)
Japanese (ja)
Other versions
JPS54109785A (en
Inventor
Masanori Kikuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP1715578A priority Critical patent/JPS54109785A/ja
Priority to DE2847305A priority patent/DE2847305C2/de
Publication of JPS54109785A publication Critical patent/JPS54109785A/ja
Publication of JPS6135710B2 publication Critical patent/JPS6135710B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Semiconductor Memories (AREA)
  • Non-Volatile Memory (AREA)
JP1715578A 1977-10-31 1978-02-16 Semiconductor device Granted JPS54109785A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1715578A JPS54109785A (en) 1978-02-16 1978-02-16 Semiconductor device
DE2847305A DE2847305C2 (de) 1977-10-31 1978-10-31 Verfahren zur Herstellung einer Halbleiterspeichervorrichtung mit schwebender Gateelektrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1715578A JPS54109785A (en) 1978-02-16 1978-02-16 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS54109785A JPS54109785A (en) 1979-08-28
JPS6135710B2 true JPS6135710B2 (enExample) 1986-08-14

Family

ID=11936081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1715578A Granted JPS54109785A (en) 1977-10-31 1978-02-16 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS54109785A (enExample)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01171712A (ja) * 1987-12-26 1989-07-06 Osaka Diamond Ind Co Ltd 微細孔の加工法並びに加工用ドリル
EP3534158A1 (en) 2018-03-01 2019-09-04 Shimadzu Corporation Method for preparing sample and analysis method
EP3614150A1 (en) 2018-08-24 2020-02-26 Shimadzu Corporation Method for preparing analytical sample, analysis method, and kit for preparing analytical sample
EP3628690A1 (en) 2018-08-24 2020-04-01 Shimadzu Corporation Method for preparing analytical sample, analysis method, and kit for preparing analytical sample
EP3632936A1 (en) 2018-10-03 2020-04-08 Shimadzu Corporation Method for preparing analytical sample, analysis method, and kit for preparing analytical sample
WO2021010221A1 (ja) 2019-07-12 2021-01-21 株式会社島津製作所 分析用試料の調製方法、分析方法および分析用試料の調製用キット
WO2021014958A1 (ja) * 2019-07-23 2021-01-28 株式会社島津製作所 質量分析方法、質量分析装置およびプログラム
EP3812767A1 (en) 2019-10-21 2021-04-28 Shimadzu Corporation Method for preparing analysis sample, analysis method, and kit for preparing analysis sample

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5075775A (enExample) * 1973-11-06 1975-06-21
GB1540450A (en) * 1975-10-29 1979-02-14 Intel Corp Self-aligning double polycrystalline silicon etching process

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01171712A (ja) * 1987-12-26 1989-07-06 Osaka Diamond Ind Co Ltd 微細孔の加工法並びに加工用ドリル
EP3534158A1 (en) 2018-03-01 2019-09-04 Shimadzu Corporation Method for preparing sample and analysis method
EP3614150A1 (en) 2018-08-24 2020-02-26 Shimadzu Corporation Method for preparing analytical sample, analysis method, and kit for preparing analytical sample
EP3628690A1 (en) 2018-08-24 2020-04-01 Shimadzu Corporation Method for preparing analytical sample, analysis method, and kit for preparing analytical sample
EP3632936A1 (en) 2018-10-03 2020-04-08 Shimadzu Corporation Method for preparing analytical sample, analysis method, and kit for preparing analytical sample
WO2021010221A1 (ja) 2019-07-12 2021-01-21 株式会社島津製作所 分析用試料の調製方法、分析方法および分析用試料の調製用キット
WO2021014958A1 (ja) * 2019-07-23 2021-01-28 株式会社島津製作所 質量分析方法、質量分析装置およびプログラム
EP3812767A1 (en) 2019-10-21 2021-04-28 Shimadzu Corporation Method for preparing analysis sample, analysis method, and kit for preparing analysis sample

Also Published As

Publication number Publication date
JPS54109785A (en) 1979-08-28

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