JPS6131330Y2 - - Google Patents

Info

Publication number
JPS6131330Y2
JPS6131330Y2 JP1979105524U JP10552479U JPS6131330Y2 JP S6131330 Y2 JPS6131330 Y2 JP S6131330Y2 JP 1979105524 U JP1979105524 U JP 1979105524U JP 10552479 U JP10552479 U JP 10552479U JP S6131330 Y2 JPS6131330 Y2 JP S6131330Y2
Authority
JP
Japan
Prior art keywords
reticle
pattern
glass substrate
semiconductor substrate
predetermined pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1979105524U
Other languages
English (en)
Japanese (ja)
Other versions
JPS5623939U (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1979105524U priority Critical patent/JPS6131330Y2/ja
Publication of JPS5623939U publication Critical patent/JPS5623939U/ja
Application granted granted Critical
Publication of JPS6131330Y2 publication Critical patent/JPS6131330Y2/ja
Expired legal-status Critical Current

Links

JP1979105524U 1979-07-31 1979-07-31 Expired JPS6131330Y2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1979105524U JPS6131330Y2 (enrdf_load_stackoverflow) 1979-07-31 1979-07-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1979105524U JPS6131330Y2 (enrdf_load_stackoverflow) 1979-07-31 1979-07-31

Publications (2)

Publication Number Publication Date
JPS5623939U JPS5623939U (enrdf_load_stackoverflow) 1981-03-04
JPS6131330Y2 true JPS6131330Y2 (enrdf_load_stackoverflow) 1986-09-11

Family

ID=29338181

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1979105524U Expired JPS6131330Y2 (enrdf_load_stackoverflow) 1979-07-31 1979-07-31

Country Status (1)

Country Link
JP (1) JPS6131330Y2 (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS5623939U (enrdf_load_stackoverflow) 1981-03-04

Similar Documents

Publication Publication Date Title
JP5714672B2 (ja) マスクブランク用基板、マスクブランク、露光用マスク、半導体デバイスの製造方法、及びマスクブランク用基板の製造方法
JPS6131330Y2 (enrdf_load_stackoverflow)
JP4803576B2 (ja) マスクブランク用基板、マスクブランク、露光用マスク、半導体デバイスの製造方法、及びマスクブランク用基板の製造方法
US3507592A (en) Method of fabricating photomasks
JPH08305006A (ja) 感光性樹脂版の製造方法
JPH0588531B2 (enrdf_load_stackoverflow)
JP3956245B2 (ja) フォトマスク装置
JPH0664337B2 (ja) 半導体集積回路用ホトマスク
JPH04216553A (ja) 半導体製造用マスク
JP2850061B2 (ja) 基板露光装置
JP3445666B2 (ja) 露光装置
JPS63210844A (ja) 露光用マスク
JPH0235445B2 (enrdf_load_stackoverflow)
JPH11151729A (ja) 高精度な感光性樹脂版の製造方法及び装置
JPH0641235Y2 (ja) 感光材料露光装置
JPH0527413A (ja) 露光装置用ホトマスク
JPS6144208Y2 (enrdf_load_stackoverflow)
JPS63131143A (ja) フオトマスク
JPH0633893Y2 (ja) 額 縁
JP2834834B2 (ja) 露光装置における原版開閉装置
JPS6290660A (ja) 露光装置
JPH0373428U (enrdf_load_stackoverflow)
JPS60140959U (ja) 大口径レンズでの像収差補正装置
JP2000250225A (ja) 感光性樹脂版の製版方法及び装置
JPH0525815U (ja) 弾性表面波装置の製造装置。