JPS6129534B2 - - Google Patents

Info

Publication number
JPS6129534B2
JPS6129534B2 JP53124236A JP12423678A JPS6129534B2 JP S6129534 B2 JPS6129534 B2 JP S6129534B2 JP 53124236 A JP53124236 A JP 53124236A JP 12423678 A JP12423678 A JP 12423678A JP S6129534 B2 JPS6129534 B2 JP S6129534B2
Authority
JP
Japan
Prior art keywords
wafer
electron beam
holder
conductive
insulating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53124236A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5464477A (en
Inventor
Jei Zashio Jon
Daburyu Samyueruzu Maikeru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of JPS5464477A publication Critical patent/JPS5464477A/ja
Publication of JPS6129534B2 publication Critical patent/JPS6129534B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0277—Electrolithographic processes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP12423678A 1977-10-11 1978-10-11 Method of and device for forming electric connection from semiconductor wafer to conductive region Granted JPS5464477A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US84067477A 1977-10-11 1977-10-11

Publications (2)

Publication Number Publication Date
JPS5464477A JPS5464477A (en) 1979-05-24
JPS6129534B2 true JPS6129534B2 (cs) 1986-07-07

Family

ID=25282934

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12423678A Granted JPS5464477A (en) 1977-10-11 1978-10-11 Method of and device for forming electric connection from semiconductor wafer to conductive region

Country Status (6)

Country Link
JP (1) JPS5464477A (cs)
CA (1) CA1118535A (cs)
DE (1) DE2843310C2 (cs)
FR (1) FR2406304A1 (cs)
GB (1) GB1604004A (cs)
NL (1) NL7810167A (cs)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55162004A (en) * 1979-06-06 1980-12-17 Toshiba Corp Electric charge corpuscular ray irradiation unit
US4323638A (en) * 1980-08-18 1982-04-06 Bell Telephone Laboratories, Incorporated Reducing charging effects in charged-particle-beam lithography
JPS5744543U (cs) * 1980-08-27 1982-03-11
US7038204B2 (en) 2004-05-26 2006-05-02 International Business Machines Corporation Method for reducing proximity effects in electron beam lithography

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3390012A (en) * 1964-05-14 1968-06-25 Texas Instruments Inc Method of making dielectric bodies having conducting portions
DE1800212A1 (de) * 1968-10-01 1970-05-06 Telefunken Patent Verfahren zum Herstellen einer Halbleiteranordnung
DE1800193A1 (de) * 1968-10-01 1970-05-14 Telefunken Patent Verfahren zum Herstellen von Kontakten
US3710101A (en) * 1970-10-06 1973-01-09 Westinghouse Electric Corp Apparatus and method for alignment of members to electron beams
JPS5183788A (en) * 1974-12-12 1976-07-22 Du Pont Daioodo oyobi kanrendodenrookeiseisurukozotai

Also Published As

Publication number Publication date
DE2843310A1 (de) 1979-04-19
JPS5464477A (en) 1979-05-24
GB1604004A (en) 1981-12-02
FR2406304A1 (fr) 1979-05-11
DE2843310C2 (de) 1983-06-01
NL7810167A (nl) 1979-04-17
CA1118535A (en) 1982-02-16
FR2406304B1 (cs) 1983-01-07

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