JPS6129494B2 - - Google Patents

Info

Publication number
JPS6129494B2
JPS6129494B2 JP53073883A JP7388378A JPS6129494B2 JP S6129494 B2 JPS6129494 B2 JP S6129494B2 JP 53073883 A JP53073883 A JP 53073883A JP 7388378 A JP7388378 A JP 7388378A JP S6129494 B2 JPS6129494 B2 JP S6129494B2
Authority
JP
Japan
Prior art keywords
developer
temperature
radiation
substrate
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53073883A
Other languages
English (en)
Japanese (ja)
Other versions
JPS552213A (en
Inventor
Katsuhiro Kawabuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO ERU ESU AI GIJUTSU KENKYU KUMIAI filed Critical CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority to JP7388378A priority Critical patent/JPS552213A/ja
Publication of JPS552213A publication Critical patent/JPS552213A/ja
Publication of JPS6129494B2 publication Critical patent/JPS6129494B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP7388378A 1978-06-19 1978-06-19 Developing method Granted JPS552213A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7388378A JPS552213A (en) 1978-06-19 1978-06-19 Developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7388378A JPS552213A (en) 1978-06-19 1978-06-19 Developing method

Publications (2)

Publication Number Publication Date
JPS552213A JPS552213A (en) 1980-01-09
JPS6129494B2 true JPS6129494B2 (enrdf_load_stackoverflow) 1986-07-07

Family

ID=13531043

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7388378A Granted JPS552213A (en) 1978-06-19 1978-06-19 Developing method

Country Status (1)

Country Link
JP (1) JPS552213A (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4429983A (en) * 1982-03-22 1984-02-07 International Business Machines Corporation Developing apparatus for exposed photoresist coated wafers
JPS5972136A (ja) * 1982-10-19 1984-04-24 Toshiba Corp レジスト・パタ−ン形成方法
JPS59144220U (ja) * 1983-03-18 1984-09-27 トキコ株式会社 圧縮機の連接棒
JPS60117733A (ja) * 1983-11-30 1985-06-25 Canon Hanbai Kk ウエハ現像装置
JPS62276827A (ja) * 1985-11-28 1987-12-01 Daikin Ind Ltd レジスト現像装置
US4827867A (en) * 1985-11-28 1989-05-09 Daikin Industries, Ltd. Resist developing apparatus
JPS63170935U (enrdf_load_stackoverflow) * 1987-04-27 1988-11-07
JPH0210824A (ja) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd 電子線レジスト現像方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50108005A (enrdf_load_stackoverflow) * 1974-01-31 1975-08-26
JPS5159504A (en) * 1974-11-21 1976-05-24 Fuji Photo Film Co Ltd Kankoseiheiban insatsubanno genzohoho
JPS5822736B2 (ja) * 1975-01-10 1983-05-11 富士写真フイルム株式会社 ゲンゾウエキソセイブツ

Also Published As

Publication number Publication date
JPS552213A (en) 1980-01-09

Similar Documents

Publication Publication Date Title
US4976818A (en) Fine pattern forming method
US5366851A (en) Device fabrication process
JPS6129494B2 (enrdf_load_stackoverflow)
EP0000995A1 (en) Apparatus and method for the controlled processing of radiation sensitive devices in dependence upon the temperature of the developer liquid
US4814243A (en) Thermal processing of photoresist materials
GB2171530A (en) Method for image enhancement in positive photoresist by vapor diffusion image reversal
JPH05343308A (ja) 半導体装置の製造方法
US3853648A (en) Process for forming a metal oxide pattern
JP2994501B2 (ja) パターン形成方法
US3506440A (en) Method of reinforcing photosensitive resists formed on photoengraving plates
EP0021719B1 (en) Method for producing negative resist images, and resist images
US4101782A (en) Process for making patterns in resist and for making ion absorption masks useful therewith
JPS59124134A (ja) レジスト・マスクの形成方法
US3052541A (en) Photographic reproduction process and apparatus therefor
JP3020523B2 (ja) 図形露光装置とその方法
US6372389B1 (en) Method and apparatus for forming resist pattern
EP0209152B1 (en) Pre-exposure method for increased sensitivity in high contrast resist development
JPS5832420A (ja) 電子ビ−ム描画方法
JPH07253676A (ja) レジストパターン形成方法
US3669669A (en) Cyclic polyisoprene photoresist compositions
JPS63246822A (ja) パタ−ン形成方法
US6896997B2 (en) Method for forming resist pattern
JPH02848B2 (enrdf_load_stackoverflow)
EP0313993A1 (en) Pattern forming method
JPS5621328A (en) Method of making pattern