JPS552213A - Developing method - Google Patents

Developing method

Info

Publication number
JPS552213A
JPS552213A JP7388378A JP7388378A JPS552213A JP S552213 A JPS552213 A JP S552213A JP 7388378 A JP7388378 A JP 7388378A JP 7388378 A JP7388378 A JP 7388378A JP S552213 A JPS552213 A JP S552213A
Authority
JP
Japan
Prior art keywords
film
substrate
developing
radiation
developing solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7388378A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6129494B2 (enrdf_load_stackoverflow
Inventor
Katsuhiro Kawabuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP7388378A priority Critical patent/JPS552213A/ja
Publication of JPS552213A publication Critical patent/JPS552213A/ja
Publication of JPS6129494B2 publication Critical patent/JPS6129494B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP7388378A 1978-06-19 1978-06-19 Developing method Granted JPS552213A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7388378A JPS552213A (en) 1978-06-19 1978-06-19 Developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7388378A JPS552213A (en) 1978-06-19 1978-06-19 Developing method

Publications (2)

Publication Number Publication Date
JPS552213A true JPS552213A (en) 1980-01-09
JPS6129494B2 JPS6129494B2 (enrdf_load_stackoverflow) 1986-07-07

Family

ID=13531043

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7388378A Granted JPS552213A (en) 1978-06-19 1978-06-19 Developing method

Country Status (1)

Country Link
JP (1) JPS552213A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58168229A (ja) * 1982-03-22 1983-10-04 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン 処理方法
JPS5972136A (ja) * 1982-10-19 1984-04-24 Toshiba Corp レジスト・パタ−ン形成方法
JPS59144220U (ja) * 1983-03-18 1984-09-27 トキコ株式会社 圧縮機の連接棒
JPS60117733A (ja) * 1983-11-30 1985-06-25 Canon Hanbai Kk ウエハ現像装置
JPS62276827A (ja) * 1985-11-28 1987-12-01 Daikin Ind Ltd レジスト現像装置
JPS63170935U (enrdf_load_stackoverflow) * 1987-04-27 1988-11-07
US4827867A (en) * 1985-11-28 1989-05-09 Daikin Industries, Ltd. Resist developing apparatus
JPH0210824A (ja) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd 電子線レジスト現像方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50108005A (enrdf_load_stackoverflow) * 1974-01-31 1975-08-26
JPS5159504A (en) * 1974-11-21 1976-05-24 Fuji Photo Film Co Ltd Kankoseiheiban insatsubanno genzohoho
JPS5180228A (ja) * 1975-01-10 1976-07-13 Fuji Photo Film Co Ltd Genzoekisoseibutsu

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50108005A (enrdf_load_stackoverflow) * 1974-01-31 1975-08-26
JPS5159504A (en) * 1974-11-21 1976-05-24 Fuji Photo Film Co Ltd Kankoseiheiban insatsubanno genzohoho
JPS5180228A (ja) * 1975-01-10 1976-07-13 Fuji Photo Film Co Ltd Genzoekisoseibutsu

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58168229A (ja) * 1982-03-22 1983-10-04 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン 処理方法
JPS5972136A (ja) * 1982-10-19 1984-04-24 Toshiba Corp レジスト・パタ−ン形成方法
JPS59144220U (ja) * 1983-03-18 1984-09-27 トキコ株式会社 圧縮機の連接棒
JPS60117733A (ja) * 1983-11-30 1985-06-25 Canon Hanbai Kk ウエハ現像装置
JPS62276827A (ja) * 1985-11-28 1987-12-01 Daikin Ind Ltd レジスト現像装置
US4827867A (en) * 1985-11-28 1989-05-09 Daikin Industries, Ltd. Resist developing apparatus
JPS63170935U (enrdf_load_stackoverflow) * 1987-04-27 1988-11-07
JPH0210824A (ja) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd 電子線レジスト現像方法

Also Published As

Publication number Publication date
JPS6129494B2 (enrdf_load_stackoverflow) 1986-07-07

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