JPS6128371B2 - - Google Patents
Info
- Publication number
- JPS6128371B2 JPS6128371B2 JP55064287A JP6428780A JPS6128371B2 JP S6128371 B2 JPS6128371 B2 JP S6128371B2 JP 55064287 A JP55064287 A JP 55064287A JP 6428780 A JP6428780 A JP 6428780A JP S6128371 B2 JPS6128371 B2 JP S6128371B2
- Authority
- JP
- Japan
- Prior art keywords
- tube
- reaction
- gas
- reaction tube
- generation chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6428780A JPS56158143A (en) | 1980-05-12 | 1980-05-12 | Reduced pressure type vapor phase growing device |
| DE19813118848 DE3118848C2 (de) | 1980-05-12 | 1981-05-12 | Niederdruck-Beschichtungsvorrichtung |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6428780A JPS56158143A (en) | 1980-05-12 | 1980-05-12 | Reduced pressure type vapor phase growing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56158143A JPS56158143A (en) | 1981-12-05 |
| JPS6128371B2 true JPS6128371B2 (cs) | 1986-06-30 |
Family
ID=13253861
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6428780A Granted JPS56158143A (en) | 1980-05-12 | 1980-05-12 | Reduced pressure type vapor phase growing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56158143A (cs) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6061722U (ja) * | 1983-09-30 | 1985-04-30 | 株式会社島津製作所 | 成膜装置 |
| JPS60192327A (ja) * | 1984-03-14 | 1985-09-30 | Toshiba Corp | 半導体製造装置の洗浄方法 |
| JPS6114726A (ja) * | 1984-06-29 | 1986-01-22 | Fujitsu Ltd | 半導体基板の処理方法 |
| JPH0693454B2 (ja) * | 1985-10-03 | 1994-11-16 | 松下電器産業株式会社 | 半導体装置の製造方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5216482A (en) * | 1975-07-30 | 1977-02-07 | Toshiba Corp | Surface treatment apparatus using activated gas |
-
1980
- 1980-05-12 JP JP6428780A patent/JPS56158143A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56158143A (en) | 1981-12-05 |
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