JPS6127636A - ドライエツチング方法 - Google Patents

ドライエツチング方法

Info

Publication number
JPS6127636A
JPS6127636A JP59148108A JP14810884A JPS6127636A JP S6127636 A JPS6127636 A JP S6127636A JP 59148108 A JP59148108 A JP 59148108A JP 14810884 A JP14810884 A JP 14810884A JP S6127636 A JPS6127636 A JP S6127636A
Authority
JP
Japan
Prior art keywords
etching
film
plasma
dry etching
holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59148108A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0426213B2 (OSRAM
Inventor
Jun Ozaki
純 尾崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP59148108A priority Critical patent/JPS6127636A/ja
Publication of JPS6127636A publication Critical patent/JPS6127636A/ja
Publication of JPH0426213B2 publication Critical patent/JPH0426213B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/00—

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP59148108A 1984-07-17 1984-07-17 ドライエツチング方法 Granted JPS6127636A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59148108A JPS6127636A (ja) 1984-07-17 1984-07-17 ドライエツチング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59148108A JPS6127636A (ja) 1984-07-17 1984-07-17 ドライエツチング方法

Publications (2)

Publication Number Publication Date
JPS6127636A true JPS6127636A (ja) 1986-02-07
JPH0426213B2 JPH0426213B2 (OSRAM) 1992-05-06

Family

ID=15445425

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59148108A Granted JPS6127636A (ja) 1984-07-17 1984-07-17 ドライエツチング方法

Country Status (1)

Country Link
JP (1) JPS6127636A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6430228A (en) * 1987-07-27 1989-02-01 Nippon Telegraph & Telephone Manufacture of semiconductor device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57192030A (en) * 1981-05-20 1982-11-26 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS58127329A (ja) * 1982-01-26 1983-07-29 Seiko Epson Corp 半導体基板の絶縁保護膜の蝕刻方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57192030A (en) * 1981-05-20 1982-11-26 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS58127329A (ja) * 1982-01-26 1983-07-29 Seiko Epson Corp 半導体基板の絶縁保護膜の蝕刻方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6430228A (en) * 1987-07-27 1989-02-01 Nippon Telegraph & Telephone Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPH0426213B2 (OSRAM) 1992-05-06

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