JPS6124817B2 - - Google Patents

Info

Publication number
JPS6124817B2
JPS6124817B2 JP52029718A JP2971877A JPS6124817B2 JP S6124817 B2 JPS6124817 B2 JP S6124817B2 JP 52029718 A JP52029718 A JP 52029718A JP 2971877 A JP2971877 A JP 2971877A JP S6124817 B2 JPS6124817 B2 JP S6124817B2
Authority
JP
Japan
Prior art keywords
high frequency
etching
electrode
electrodes
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52029718A
Other languages
English (en)
Japanese (ja)
Other versions
JPS53114679A (en
Inventor
Masanao Itoga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2971877A priority Critical patent/JPS53114679A/ja
Publication of JPS53114679A publication Critical patent/JPS53114679A/ja
Publication of JPS6124817B2 publication Critical patent/JPS6124817B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP2971877A 1977-03-17 1977-03-17 Plasm etching unit Granted JPS53114679A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2971877A JPS53114679A (en) 1977-03-17 1977-03-17 Plasm etching unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2971877A JPS53114679A (en) 1977-03-17 1977-03-17 Plasm etching unit

Publications (2)

Publication Number Publication Date
JPS53114679A JPS53114679A (en) 1978-10-06
JPS6124817B2 true JPS6124817B2 (enrdf_load_stackoverflow) 1986-06-12

Family

ID=12283881

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2971877A Granted JPS53114679A (en) 1977-03-17 1977-03-17 Plasm etching unit

Country Status (1)

Country Link
JP (1) JPS53114679A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55118637A (en) * 1979-03-06 1980-09-11 Chiyou Lsi Gijutsu Kenkyu Kumiai Plasma etching apparatus
FR2463975A1 (fr) * 1979-08-22 1981-02-27 Onera (Off Nat Aerospatiale) Procede et appareil pour la gravure chimique par voie seche des circuits integres
JPS5750435A (en) * 1980-09-11 1982-03-24 Toshiba Corp Plasma etching device
US4433214A (en) * 1981-12-24 1984-02-21 Motorola, Inc. Acoustical transducer with a slotted piston suspension
JPS60140763U (ja) * 1984-02-24 1985-09-18 日本電子株式会社 プラズマ装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS48103433A (enrdf_load_stackoverflow) * 1972-04-17 1973-12-25

Also Published As

Publication number Publication date
JPS53114679A (en) 1978-10-06

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