JPS61245164A - パタ−ン修正装置 - Google Patents

パタ−ン修正装置

Info

Publication number
JPS61245164A
JPS61245164A JP8727685A JP8727685A JPS61245164A JP S61245164 A JPS61245164 A JP S61245164A JP 8727685 A JP8727685 A JP 8727685A JP 8727685 A JP8727685 A JP 8727685A JP S61245164 A JPS61245164 A JP S61245164A
Authority
JP
Japan
Prior art keywords
sample
ion beam
pattern
gas
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8727685A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6325660B2 (enrdf_load_stackoverflow
Inventor
Tatsuya Adachi
達哉 足立
Masahiro Yamamoto
昌宏 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP8727685A priority Critical patent/JPS61245164A/ja
Priority to EP86303036A priority patent/EP0199585B1/en
Priority to DE8686303036T priority patent/DE3672378D1/de
Publication of JPS61245164A publication Critical patent/JPS61245164A/ja
Publication of JPS6325660B2 publication Critical patent/JPS6325660B2/ja
Priority to US07/244,128 priority patent/US5086230A/en
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using ion beam radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP8727685A 1985-04-23 1985-04-23 パタ−ン修正装置 Granted JPS61245164A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP8727685A JPS61245164A (ja) 1985-04-23 1985-04-23 パタ−ン修正装置
EP86303036A EP0199585B1 (en) 1985-04-23 1986-04-22 Apparatus for depositing electrically conductive and/or electrically insulating material on a workpiece
DE8686303036T DE3672378D1 (de) 1985-04-23 1986-04-22 Vorrichtung zur abscheidung eines elektrisch leitenden und/oder nichtleitenden materials auf einem gegenstand.
US07/244,128 US5086230A (en) 1985-04-23 1988-09-14 Apparatus for forming, correcting pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8727685A JPS61245164A (ja) 1985-04-23 1985-04-23 パタ−ン修正装置

Publications (2)

Publication Number Publication Date
JPS61245164A true JPS61245164A (ja) 1986-10-31
JPS6325660B2 JPS6325660B2 (enrdf_load_stackoverflow) 1988-05-26

Family

ID=13910248

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8727685A Granted JPS61245164A (ja) 1985-04-23 1985-04-23 パタ−ン修正装置

Country Status (1)

Country Link
JP (1) JPS61245164A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63153841A (ja) * 1986-12-18 1988-06-27 Agency Of Ind Science & Technol 高密度線電極の製造方法
JPS63237438A (ja) * 1987-03-25 1988-10-03 Mitsubishi Electric Corp 半導体装置の電極形成方法
JPS6435913A (en) * 1987-07-31 1989-02-07 Hitachi Ltd Method and device for correcting defect of device
JPS6471149A (en) * 1987-09-11 1989-03-16 Hitachi Ltd Formation of wiring and device therefor
JPH01140742A (ja) * 1987-11-27 1989-06-01 Hitachi Ltd イオンビーム加工方法
JPH01215022A (ja) * 1988-02-24 1989-08-29 Mitsubishi Electric Corp 半導体装置の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5966124A (ja) * 1982-10-08 1984-04-14 Hitachi Ltd 表面処理方法および装置
JPS59168652A (ja) * 1983-03-16 1984-09-22 Hitachi Ltd 素子修正方法及びその装置
JPS6322577A (ja) * 1986-06-25 1988-01-30 フアルミタリア・カルロ・エルバ・エツセ・ピ−・ア− ｔ−ブチルエルゴリン誘導体

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5966124A (ja) * 1982-10-08 1984-04-14 Hitachi Ltd 表面処理方法および装置
JPS59168652A (ja) * 1983-03-16 1984-09-22 Hitachi Ltd 素子修正方法及びその装置
JPS6322577A (ja) * 1986-06-25 1988-01-30 フアルミタリア・カルロ・エルバ・エツセ・ピ−・ア− ｔ−ブチルエルゴリン誘導体

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63153841A (ja) * 1986-12-18 1988-06-27 Agency Of Ind Science & Technol 高密度線電極の製造方法
JPS63237438A (ja) * 1987-03-25 1988-10-03 Mitsubishi Electric Corp 半導体装置の電極形成方法
JPS6435913A (en) * 1987-07-31 1989-02-07 Hitachi Ltd Method and device for correcting defect of device
JPS6471149A (en) * 1987-09-11 1989-03-16 Hitachi Ltd Formation of wiring and device therefor
JPH01140742A (ja) * 1987-11-27 1989-06-01 Hitachi Ltd イオンビーム加工方法
JPH01215022A (ja) * 1988-02-24 1989-08-29 Mitsubishi Electric Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS6325660B2 (enrdf_load_stackoverflow) 1988-05-26

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