JPS6123324A - 乾燥装置 - Google Patents

乾燥装置

Info

Publication number
JPS6123324A
JPS6123324A JP59142382A JP14238284A JPS6123324A JP S6123324 A JPS6123324 A JP S6123324A JP 59142382 A JP59142382 A JP 59142382A JP 14238284 A JP14238284 A JP 14238284A JP S6123324 A JPS6123324 A JP S6123324A
Authority
JP
Japan
Prior art keywords
wafer
steam
drying
mist
dried
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59142382A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0566726B2 (enExample
Inventor
Etsuro Egashira
江頭　悦郎
Masayuki Ueda
正幸 上田
Yoshihiro Kagawa
賀川　善裕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Microcomputer System Ltd
Hitachi Ltd
Original Assignee
Hitachi Ltd
Hitachi Microcomputer Engineering Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Microcomputer Engineering Ltd filed Critical Hitachi Ltd
Priority to JP59142382A priority Critical patent/JPS6123324A/ja
Publication of JPS6123324A publication Critical patent/JPS6123324A/ja
Publication of JPH0566726B2 publication Critical patent/JPH0566726B2/ja
Granted legal-status Critical Current

Links

Classifications

    • F26B21/471—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/04—Apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP59142382A 1984-07-11 1984-07-11 乾燥装置 Granted JPS6123324A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59142382A JPS6123324A (ja) 1984-07-11 1984-07-11 乾燥装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59142382A JPS6123324A (ja) 1984-07-11 1984-07-11 乾燥装置

Publications (2)

Publication Number Publication Date
JPS6123324A true JPS6123324A (ja) 1986-01-31
JPH0566726B2 JPH0566726B2 (enExample) 1993-09-22

Family

ID=15314063

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59142382A Granted JPS6123324A (ja) 1984-07-11 1984-07-11 乾燥装置

Country Status (1)

Country Link
JP (1) JPS6123324A (enExample)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61151335U (enExample) * 1985-03-11 1986-09-18
JPS62195128A (ja) * 1986-02-21 1987-08-27 Hitachi Tokyo Electron Co Ltd 処理装置
JPS62245639A (ja) * 1986-04-18 1987-10-26 Hitachi Ltd ベ−パ乾燥装置
JPS6364031U (enExample) * 1986-10-16 1988-04-27
JPS6443384A (en) * 1987-08-12 1989-02-15 Hitachi Ltd Steam washing method and washer
EP0454873A4 (en) * 1989-11-21 1992-05-06 Interface Technical Laboratories Co., Ltd. Drying method and apparatus therefor
JPH07211689A (ja) * 1994-01-18 1995-08-11 Shin Etsu Handotai Co Ltd ウェーハホルダー
KR100357316B1 (ko) * 1993-10-29 2002-10-19 도오교오에레구토론큐우슈우가부시끼가이샤 기판 건조장치 및 기판 건조방법
KR100361331B1 (ko) * 1997-05-22 2003-02-11 료덴 세미컨덕터 시스템 엔지니어링 (주) 건조장치

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61151335U (enExample) * 1985-03-11 1986-09-18
JPS62195128A (ja) * 1986-02-21 1987-08-27 Hitachi Tokyo Electron Co Ltd 処理装置
JPS62245639A (ja) * 1986-04-18 1987-10-26 Hitachi Ltd ベ−パ乾燥装置
JPS6364031U (enExample) * 1986-10-16 1988-04-27
JPS6443384A (en) * 1987-08-12 1989-02-15 Hitachi Ltd Steam washing method and washer
EP0454873A4 (en) * 1989-11-21 1992-05-06 Interface Technical Laboratories Co., Ltd. Drying method and apparatus therefor
US5222307A (en) * 1989-11-21 1993-06-29 Interface Technical Laboratories Co., Ltd. Drying method and apparatus therefor
KR100357316B1 (ko) * 1993-10-29 2002-10-19 도오교오에레구토론큐우슈우가부시끼가이샤 기판 건조장치 및 기판 건조방법
JPH07211689A (ja) * 1994-01-18 1995-08-11 Shin Etsu Handotai Co Ltd ウェーハホルダー
KR100361331B1 (ko) * 1997-05-22 2003-02-11 료덴 세미컨덕터 시스템 엔지니어링 (주) 건조장치

Also Published As

Publication number Publication date
JPH0566726B2 (enExample) 1993-09-22

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