JPS6123324A - 乾燥装置 - Google Patents
乾燥装置Info
- Publication number
- JPS6123324A JPS6123324A JP59142382A JP14238284A JPS6123324A JP S6123324 A JPS6123324 A JP S6123324A JP 59142382 A JP59142382 A JP 59142382A JP 14238284 A JP14238284 A JP 14238284A JP S6123324 A JPS6123324 A JP S6123324A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- steam
- drying
- mist
- dried
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements for supplying or controlling air or other gases for drying solid materials or objects
- F26B21/40—Arrangements for supplying or controlling air or other gases for drying solid materials or objects using gases other than air
- F26B21/471—Arrangements for supplying or controlling air or other gases for drying solid materials or objects using gases other than air condensing vapours onto the surface of the materials to be dried
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/04—Apparatus
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59142382A JPS6123324A (ja) | 1984-07-11 | 1984-07-11 | 乾燥装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59142382A JPS6123324A (ja) | 1984-07-11 | 1984-07-11 | 乾燥装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6123324A true JPS6123324A (ja) | 1986-01-31 |
| JPH0566726B2 JPH0566726B2 (enExample) | 1993-09-22 |
Family
ID=15314063
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59142382A Granted JPS6123324A (ja) | 1984-07-11 | 1984-07-11 | 乾燥装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6123324A (enExample) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61151335U (enExample) * | 1985-03-11 | 1986-09-18 | ||
| JPS62195128A (ja) * | 1986-02-21 | 1987-08-27 | Hitachi Tokyo Electron Co Ltd | 処理装置 |
| JPS62245639A (ja) * | 1986-04-18 | 1987-10-26 | Hitachi Ltd | ベ−パ乾燥装置 |
| JPS6364031U (enExample) * | 1986-10-16 | 1988-04-27 | ||
| JPS6443384A (en) * | 1987-08-12 | 1989-02-15 | Hitachi Ltd | Steam washing method and washer |
| EP0454873A4 (en) * | 1989-11-21 | 1992-05-06 | Interface Technical Laboratories Co., Ltd. | Drying method and apparatus therefor |
| JPH07211689A (ja) * | 1994-01-18 | 1995-08-11 | Shin Etsu Handotai Co Ltd | ウェーハホルダー |
| KR100357316B1 (ko) * | 1993-10-29 | 2002-10-19 | 도오교오에레구토론큐우슈우가부시끼가이샤 | 기판 건조장치 및 기판 건조방법 |
| KR100361331B1 (ko) * | 1997-05-22 | 2003-02-11 | 료덴 세미컨덕터 시스템 엔지니어링 (주) | 건조장치 |
-
1984
- 1984-07-11 JP JP59142382A patent/JPS6123324A/ja active Granted
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61151335U (enExample) * | 1985-03-11 | 1986-09-18 | ||
| JPS62195128A (ja) * | 1986-02-21 | 1987-08-27 | Hitachi Tokyo Electron Co Ltd | 処理装置 |
| JPS62245639A (ja) * | 1986-04-18 | 1987-10-26 | Hitachi Ltd | ベ−パ乾燥装置 |
| JPS6364031U (enExample) * | 1986-10-16 | 1988-04-27 | ||
| JPS6443384A (en) * | 1987-08-12 | 1989-02-15 | Hitachi Ltd | Steam washing method and washer |
| EP0454873A4 (en) * | 1989-11-21 | 1992-05-06 | Interface Technical Laboratories Co., Ltd. | Drying method and apparatus therefor |
| US5222307A (en) * | 1989-11-21 | 1993-06-29 | Interface Technical Laboratories Co., Ltd. | Drying method and apparatus therefor |
| KR100357316B1 (ko) * | 1993-10-29 | 2002-10-19 | 도오교오에레구토론큐우슈우가부시끼가이샤 | 기판 건조장치 및 기판 건조방법 |
| JPH07211689A (ja) * | 1994-01-18 | 1995-08-11 | Shin Etsu Handotai Co Ltd | ウェーハホルダー |
| KR100361331B1 (ko) * | 1997-05-22 | 2003-02-11 | 료덴 세미컨덕터 시스템 엔지니어링 (주) | 건조장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0566726B2 (enExample) | 1993-09-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US12539485B2 (en) | Devices, systems and methods for flux removal from furnace process gas | |
| US4984597A (en) | Apparatus for rinsing and drying surfaces | |
| US4911761A (en) | Process and apparatus for drying surfaces | |
| JPS6123324A (ja) | 乾燥装置 | |
| JPH06349916A (ja) | 基板上の粒子検出方法及び装置 | |
| US20020023902A1 (en) | Method and apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition | |
| US4383961A (en) | Drying process for video discs | |
| US2629459A (en) | Filter | |
| EP0428784B1 (en) | Process for drying surfaces | |
| KR101308273B1 (ko) | 재생 케미컬 제조 방법 및 설비 | |
| CN101321572A (zh) | 气体净化装置和半导体制造装置 | |
| JP2910402B2 (ja) | 蒸気乾燥方法及び蒸気乾燥槽 | |
| JPS62115725A (ja) | 処理装置 | |
| JPH058676Y2 (enExample) | ||
| JPS62115724A (ja) | 処理装置 | |
| JPS62150827A (ja) | 表面処理装置 | |
| JPS6195530A (ja) | 乾燥装置 | |
| JPH01231329A (ja) | 蒸気洗浄装置 | |
| SU1122331A1 (ru) | Способ извлечени сублимирующихс веществ из газовой смеси | |
| JPH0579944U (ja) | 半導体ウエハ乾燥機 | |
| JPS6233559B2 (enExample) | ||
| JPH01271754A (ja) | 電子写真感光体基板の洗浄方法 | |
| JPH01271753A (ja) | 電子写真感光体基板洗浄装置 | |
| JPS63160232A (ja) | 処理方法および装置 | |
| Miller et al. | Self-cleaning properties via condensation on superhydrophobic surfaces |