JPH0566726B2 - - Google Patents

Info

Publication number
JPH0566726B2
JPH0566726B2 JP59142382A JP14238284A JPH0566726B2 JP H0566726 B2 JPH0566726 B2 JP H0566726B2 JP 59142382 A JP59142382 A JP 59142382A JP 14238284 A JP14238284 A JP 14238284A JP H0566726 B2 JPH0566726 B2 JP H0566726B2
Authority
JP
Japan
Prior art keywords
mist
steam
dried
drying
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59142382A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6123324A (ja
Inventor
Etsuro Egashira
Masayuki Ueda
Yoshihiro Kagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Microcomputer System Ltd
Hitachi Ltd
Renesas Technology America Inc
Original Assignee
Hitachi Microcomputer System Ltd
Hitachi Ltd
Hitachi Micro Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Microcomputer System Ltd, Hitachi Ltd, Hitachi Micro Systems Inc filed Critical Hitachi Microcomputer System Ltd
Priority to JP59142382A priority Critical patent/JPS6123324A/ja
Publication of JPS6123324A publication Critical patent/JPS6123324A/ja
Publication of JPH0566726B2 publication Critical patent/JPH0566726B2/ja
Granted legal-status Critical Current

Links

Classifications

    • F26B21/471—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/04—Apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP59142382A 1984-07-11 1984-07-11 乾燥装置 Granted JPS6123324A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59142382A JPS6123324A (ja) 1984-07-11 1984-07-11 乾燥装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59142382A JPS6123324A (ja) 1984-07-11 1984-07-11 乾燥装置

Publications (2)

Publication Number Publication Date
JPS6123324A JPS6123324A (ja) 1986-01-31
JPH0566726B2 true JPH0566726B2 (enExample) 1993-09-22

Family

ID=15314063

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59142382A Granted JPS6123324A (ja) 1984-07-11 1984-07-11 乾燥装置

Country Status (1)

Country Link
JP (1) JPS6123324A (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH058676Y2 (enExample) * 1985-03-11 1993-03-04
JPH0682647B2 (ja) * 1986-02-21 1994-10-19 日立東京エレクトロニクス株式会社 処理装置
JP2511873B2 (ja) * 1986-04-18 1996-07-03 株式会社日立製作所 ベ−パ乾燥装置
JPS6364031U (enExample) * 1986-10-16 1988-04-27
JPS6443384A (en) * 1987-08-12 1989-02-15 Hitachi Ltd Steam washing method and washer
DE69007779T2 (de) * 1989-11-21 1994-09-22 Interface Technical Lab Co Trocknungsverfahren und vorrichtung dazu.
US5575079A (en) * 1993-10-29 1996-11-19 Tokyo Electron Limited Substrate drying apparatus and substrate drying method
JP2894535B2 (ja) * 1994-01-18 1999-05-24 信越半導体株式会社 ウェーハホルダー
JPH10321585A (ja) * 1997-05-22 1998-12-04 Mitsubishi Electric Corp 乾燥装置および乾燥方法

Also Published As

Publication number Publication date
JPS6123324A (ja) 1986-01-31

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