JPS6443384A - Steam washing method and washer - Google Patents

Steam washing method and washer

Info

Publication number
JPS6443384A
JPS6443384A JP19979687A JP19979687A JPS6443384A JP S6443384 A JPS6443384 A JP S6443384A JP 19979687 A JP19979687 A JP 19979687A JP 19979687 A JP19979687 A JP 19979687A JP S6443384 A JPS6443384 A JP S6443384A
Authority
JP
Japan
Prior art keywords
vapor
treated
materials
washing
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19979687A
Other languages
Japanese (ja)
Other versions
JPH054155B2 (en
Inventor
Hideaki Kurokawa
Katsuya Ebara
Sankichi Takahashi
Harumi Matsuzaki
Hiroaki Yoda
Takehisa Nitta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP19979687A priority Critical patent/JPS6443384A/en
Publication of JPS6443384A publication Critical patent/JPS6443384A/en
Publication of JPH054155B2 publication Critical patent/JPH054155B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

PURPOSE: To make the remaining of impurities on a surface less than in the conventional method for immersing materials to be treated into ultra-pure water or the like by heating a washing liquid to evaporate, passing mists carried over in the vapor thereof at this time through a porous membrane to remove the mists, then bringing the vapor into contact with the materials to be treated. CONSTITUTION: The mists carried over in the vapor are removed by using the porous membrane 101 at the time of washing the materials 107 to be treated by using the vapor of the washing liquid and, thereafter, the vapor is brought into contact with the surfaces of the materials to be treated to condensate the vapor. Water or an org. solvent insoluble in the water or the like is used as the washing liquid described above. The materials to be treated are various kinds of optical parts and electronic parts inclusive of semiconductor wafers, optical disks or magnetic disks or jigs for their production. Further, the ultra- pure water is preferably used as the water used for vapor washing of the semiconductor wafers. Consequently, the remaining of the impurities on the surface of the materials to be treated is made less than in the conventional method of immersing the materials to be treated into the ultra-pure water and vapor washing method.
JP19979687A 1987-08-12 1987-08-12 Steam washing method and washer Granted JPS6443384A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19979687A JPS6443384A (en) 1987-08-12 1987-08-12 Steam washing method and washer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19979687A JPS6443384A (en) 1987-08-12 1987-08-12 Steam washing method and washer

Publications (2)

Publication Number Publication Date
JPS6443384A true JPS6443384A (en) 1989-02-15
JPH054155B2 JPH054155B2 (en) 1993-01-19

Family

ID=16413763

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19979687A Granted JPS6443384A (en) 1987-08-12 1987-08-12 Steam washing method and washer

Country Status (1)

Country Link
JP (1) JPS6443384A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010034203A (en) * 2008-07-28 2010-02-12 Tokyo Electron Ltd Device and method for cleaning semiconductor manufacturing device
JP2019013913A (en) * 2017-07-11 2019-01-31 ジャパン・フィールド株式会社 Degreasing and solvent removal cleaning method for objects to be cleaned
CN112474589A (en) * 2020-10-28 2021-03-12 哈尔滨工程大学 Mobile robot camera field of vision synthesizes cleaning device based on bionical transient membrane
JP2023157245A (en) * 2022-04-14 2023-10-26 キオクシア株式会社 Cleaning equipment and semiconductor device manufacturing method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60125282A (en) * 1983-12-13 1985-07-04 有限会社タス技術研究所 Dustless cleaning and drying apparatus
JPS60246638A (en) * 1984-05-22 1985-12-06 Matsushita Electric Ind Co Ltd High pressure jet cleaning equipment
JPS6123324A (en) * 1984-07-11 1986-01-31 Hitachi Ltd Drying apparatus
JPS61129019A (en) * 1984-11-26 1986-06-17 Hitachi Ltd Absorbing type temperature circuit
JPS61138582A (en) * 1984-12-12 1986-06-26 島田理化工業株式会社 Organic solvent vapor drying method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60125282A (en) * 1983-12-13 1985-07-04 有限会社タス技術研究所 Dustless cleaning and drying apparatus
JPS60246638A (en) * 1984-05-22 1985-12-06 Matsushita Electric Ind Co Ltd High pressure jet cleaning equipment
JPS6123324A (en) * 1984-07-11 1986-01-31 Hitachi Ltd Drying apparatus
JPS61129019A (en) * 1984-11-26 1986-06-17 Hitachi Ltd Absorbing type temperature circuit
JPS61138582A (en) * 1984-12-12 1986-06-26 島田理化工業株式会社 Organic solvent vapor drying method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010034203A (en) * 2008-07-28 2010-02-12 Tokyo Electron Ltd Device and method for cleaning semiconductor manufacturing device
US8297292B2 (en) 2008-07-28 2012-10-30 Tokyo Electron Limited Cleaning device and cleaning method of semiconductor manufacturing apparatus
JP2019013913A (en) * 2017-07-11 2019-01-31 ジャパン・フィールド株式会社 Degreasing and solvent removal cleaning method for objects to be cleaned
CN112474589A (en) * 2020-10-28 2021-03-12 哈尔滨工程大学 Mobile robot camera field of vision synthesizes cleaning device based on bionical transient membrane
CN112474589B (en) * 2020-10-28 2022-01-11 哈尔滨工程大学 A comprehensive cleaning device for mobile robot camera field of view based on bionic nictitating membrane
JP2023157245A (en) * 2022-04-14 2023-10-26 キオクシア株式会社 Cleaning equipment and semiconductor device manufacturing method

Also Published As

Publication number Publication date
JPH054155B2 (en) 1993-01-19

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