JPS61219045A - 距離算出装置および自動焦点合わせ装置 - Google Patents

距離算出装置および自動焦点合わせ装置

Info

Publication number
JPS61219045A
JPS61219045A JP60058534A JP5853485A JPS61219045A JP S61219045 A JPS61219045 A JP S61219045A JP 60058534 A JP60058534 A JP 60058534A JP 5853485 A JP5853485 A JP 5853485A JP S61219045 A JPS61219045 A JP S61219045A
Authority
JP
Japan
Prior art keywords
wafer
automatic focusing
optical system
valid
air
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60058534A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0546695B2 (show.php
Inventor
Kazuyuki Oda
和幸 小田
Takasumi Yui
敬清 由井
Yoshiharu Kataoka
義治 片岡
Hideo Haneda
英夫 羽田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60058534A priority Critical patent/JPS61219045A/ja
Priority to US06/843,392 priority patent/US4714331A/en
Publication of JPS61219045A publication Critical patent/JPS61219045A/ja
Publication of JPH0546695B2 publication Critical patent/JPH0546695B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28—Systems for automatic generation of focusing signals
    • G02B7/30—Systems for automatic generation of focusing signals using parallactic triangle with a base line
    • G02B7/32—Systems for automatic generation of focusing signals using parallactic triangle with a base line using active means, e.g. light emitter
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G03F9/7057—Gas flow, e.g. for focusing, leveling or gap setting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Automatic Focus Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60058534A 1985-03-25 1985-03-25 距離算出装置および自動焦点合わせ装置 Granted JPS61219045A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60058534A JPS61219045A (ja) 1985-03-25 1985-03-25 距離算出装置および自動焦点合わせ装置
US06/843,392 US4714331A (en) 1985-03-25 1986-03-24 Method and apparatus for automatic focusing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60058534A JPS61219045A (ja) 1985-03-25 1985-03-25 距離算出装置および自動焦点合わせ装置

Publications (2)

Publication Number Publication Date
JPS61219045A true JPS61219045A (ja) 1986-09-29
JPH0546695B2 JPH0546695B2 (show.php) 1993-07-14

Family

ID=13087099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60058534A Granted JPS61219045A (ja) 1985-03-25 1985-03-25 距離算出装置および自動焦点合わせ装置

Country Status (1)

Country Link
JP (1) JPS61219045A (show.php)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6388920B2 (en) 1996-02-29 2002-05-14 Hitachi, Ltd. Semiconductor memory device having faulty cells
JP2013187206A (ja) * 2012-03-05 2013-09-19 Canon Inc 検出装置、露光装置及びデバイスを製造する方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5634844A (en) * 1979-08-30 1981-04-07 Matsushita Electric Works Ltd Flume
JPS5947731A (ja) * 1982-09-10 1984-03-17 Hitachi Ltd 投影露光装置におけるオ−トフオ−カス機構
JPS59121932A (ja) * 1982-12-28 1984-07-14 Fujitsu Ltd 自動焦点制御装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5634844A (en) * 1979-08-30 1981-04-07 Matsushita Electric Works Ltd Flume
JPS5947731A (ja) * 1982-09-10 1984-03-17 Hitachi Ltd 投影露光装置におけるオ−トフオ−カス機構
JPS59121932A (ja) * 1982-12-28 1984-07-14 Fujitsu Ltd 自動焦点制御装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6388920B2 (en) 1996-02-29 2002-05-14 Hitachi, Ltd. Semiconductor memory device having faulty cells
JP2013187206A (ja) * 2012-03-05 2013-09-19 Canon Inc 検出装置、露光装置及びデバイスを製造する方法
US9523927B2 (en) 2012-03-05 2016-12-20 Canon Kabushiki Kaisha Exposure apparatus with detection apparatus for detection of upper and lower surface marks, and device manufacturing method

Also Published As

Publication number Publication date
JPH0546695B2 (show.php) 1993-07-14

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term