JPS6120520B2 - - Google Patents
Info
- Publication number
- JPS6120520B2 JPS6120520B2 JP54056134A JP5613479A JPS6120520B2 JP S6120520 B2 JPS6120520 B2 JP S6120520B2 JP 54056134 A JP54056134 A JP 54056134A JP 5613479 A JP5613479 A JP 5613479A JP S6120520 B2 JPS6120520 B2 JP S6120520B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- layer
- seed layer
- silicon carbide
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5613479A JPS55149198A (en) | 1979-05-07 | 1979-05-07 | Manufacture of silicon carbide substrate |
| DE3002671A DE3002671C2 (de) | 1979-01-25 | 1980-01-25 | Verfahren zur Herstellung eines Siliciumcarbidsubstrats |
| US06/369,911 US4582561A (en) | 1979-01-25 | 1982-04-19 | Method for making a silicon carbide substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5613479A JPS55149198A (en) | 1979-05-07 | 1979-05-07 | Manufacture of silicon carbide substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55149198A JPS55149198A (en) | 1980-11-20 |
| JPS6120520B2 true JPS6120520B2 (enExample) | 1986-05-22 |
Family
ID=13018596
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5613479A Granted JPS55149198A (en) | 1979-01-25 | 1979-05-07 | Manufacture of silicon carbide substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55149198A (enExample) |
-
1979
- 1979-05-07 JP JP5613479A patent/JPS55149198A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55149198A (en) | 1980-11-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4623425A (en) | Method of fabricating single-crystal substrates of silicon carbide | |
| US5037502A (en) | Process for producing a single-crystal substrate of silicon carbide | |
| EP0269439A2 (en) | A heteroepitaxial growth method | |
| JPS5838399B2 (ja) | 炭化珪素結晶層の製造方法 | |
| JP3206375B2 (ja) | 単結晶薄膜の製造方法 | |
| JP3590464B2 (ja) | 4h型単結晶炭化珪素の製造方法 | |
| JPS6120514B2 (enExample) | ||
| US3200001A (en) | Method for producing extremely planar semiconductor surfaces | |
| US3290181A (en) | Method of producing pure semiconductor material by chemical transport reaction using h2s/h2 system | |
| JPS6152120B2 (enExample) | ||
| US3501356A (en) | Process for the epitaxial growth of silicon carbide | |
| JPS5838400B2 (ja) | 炭化珪素結晶層の製造方法 | |
| US3563816A (en) | Method for the vapor growth of semiconductors | |
| JPS6152119B2 (enExample) | ||
| JPS6120519B2 (enExample) | ||
| JPS6121197B2 (enExample) | ||
| JPS6115150B2 (enExample) | ||
| JPS6045159B2 (ja) | 炭化珪素結晶層の製造方法 | |
| JPS61275191A (ja) | GaAs薄膜の気相成長法 | |
| JPS623119B2 (enExample) | ||
| JPS626644B2 (enExample) | ||
| JPS6120518B2 (enExample) | ||
| JPH0443878B2 (enExample) | ||
| JPS6120517B2 (enExample) | ||
| JPS6121198B2 (enExample) |