JPS61195046U - - Google Patents

Info

Publication number
JPS61195046U
JPS61195046U JP7866585U JP7866585U JPS61195046U JP S61195046 U JPS61195046 U JP S61195046U JP 7866585 U JP7866585 U JP 7866585U JP 7866585 U JP7866585 U JP 7866585U JP S61195046 U JPS61195046 U JP S61195046U
Authority
JP
Japan
Prior art keywords
resist
nozzle
pretreatment
cleaning water
pretreatment liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7866585U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7866585U priority Critical patent/JPS61195046U/ja
Publication of JPS61195046U publication Critical patent/JPS61195046U/ja
Pending legal-status Critical Current

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  • Coating Apparatus (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案の一実施例の正面図、第２図は
その平面図、第３図は従来装置の正面図、第４図
はその平面図である。 １……回転軸、２……回転台、３……レジスト
ノズル、４……前処理ノズル、１０……半導体ウ
エーハ。 FIG. 1 is a front view of an embodiment of the present invention, FIG. 2 is a plan view thereof, FIG. 3 is a front view of a conventional device, and FIG. 4 is a plan view thereof. DESCRIPTION OF SYMBOLS 1... Rotating shaft, 2... Rotating table, 3... Resist nozzle, 4... Pretreatment nozzle, 10... Semiconductor wafer.

Claims (1)

【実用新案登録請求の範囲】 １ レジストを塗布すべき基板をチヤツキングし
て回転させる回転台と、半導体ウエーハの回転中
心にレジストを滴下するレジストノズルと、前記
半導体ウエーハの回転中心に前処理液および洗浄
水を滴下する前処理ノズルとを備えたレジスト塗
布装置。 ２ 前処理ノズルが前処理液および洗浄水の切換
えを行う切換弁を備えた実用新案登録請求の範囲
第１項記載のレジスト塗布装置。[Claims for Utility Model Registration] 1. A turntable that chucks and rotates a substrate to which a resist is applied, a resist nozzle that drops resist onto the center of rotation of a semiconductor wafer, and a pretreatment liquid and a A resist coating device equipped with a pretreatment nozzle that drips cleaning water. 2. The resist coating apparatus according to claim 1, wherein the pretreatment nozzle is provided with a switching valve for switching between the pretreatment liquid and the cleaning water.
JP7866585U 1985-05-27 1985-05-27 Pending JPS61195046U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7866585U JPS61195046U (en) 1985-05-27 1985-05-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7866585U JPS61195046U (en) 1985-05-27 1985-05-27

Publications (1)

Publication Number Publication Date
JPS61195046U true JPS61195046U (en) 1986-12-04

Family

ID=30622848

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7866585U Pending JPS61195046U (en) 1985-05-27 1985-05-27

Country Status (1)

Country Link
JP (1) JPS61195046U (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS501628A (en) * 1973-05-04 1975-01-09
JPS5441676A (en) * 1977-09-09 1979-04-03 Hitachi Ltd Photo resist coating unit
JPS5759438B2 (en) * 1972-06-16 1982-12-14 Hitachi Ltd
JPS5815234A (en) * 1981-07-20 1983-01-28 Seiko Epson Corp Nozzle structure for spin-coator
JPS5882521A (en) * 1981-07-10 1983-05-18 Hitachi Ltd Spinner

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5759438B2 (en) * 1972-06-16 1982-12-14 Hitachi Ltd
JPS501628A (en) * 1973-05-04 1975-01-09
JPS5441676A (en) * 1977-09-09 1979-04-03 Hitachi Ltd Photo resist coating unit
JPS5882521A (en) * 1981-07-10 1983-05-18 Hitachi Ltd Spinner
JPS5815234A (en) * 1981-07-20 1983-01-28 Seiko Epson Corp Nozzle structure for spin-coator

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