JPH0375530U - - Google Patents
Info
- Publication number
- JPH0375530U JPH0375530U JP13617489U JP13617489U JPH0375530U JP H0375530 U JPH0375530 U JP H0375530U JP 13617489 U JP13617489 U JP 13617489U JP 13617489 U JP13617489 U JP 13617489U JP H0375530 U JPH0375530 U JP H0375530U
- Authority
- JP
- Japan
- Prior art keywords
- spin
- rinsing liquid
- spin chuck
- rotating
- chuck
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 239000007791 liquid phase Substances 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Coating Apparatus (AREA)
Description
第１図は本考案の一実施例を示す概略図、第２
図は従来装置を示す概略図である。
１……スピンチヤツク、２，７……モーター、
３，８……軸、４……ベアリング、５……スピン
カツプ、６……ドレイン口、９……歯車、１０…
…リンス液受皿、１１……チヤンバー、１２……
排気口、１３……蓋、１４……ガス供給ノズル、
１５……被レジスト塗布基板、１６……レジスト
供給ノズル、１７……リンス液供給ノズル。
Figure 1 is a schematic diagram showing one embodiment of the present invention;
The figure is a schematic diagram showing a conventional device. 1... Spin chuck, 2, 7... Motor,
3, 8...shaft, 4...bearing, 5...spin cup, 6...drain port, 9...gear, 10...
...Rinse liquid saucer, 11...Chamber, 12...
Exhaust port, 13...lid, 14...gas supply nozzle,
15...Substrate to be coated with resist, 16...Resist supply nozzle, 17...Rinse liquid supply nozzle.
Claims (1)
せるスピンチヤツクと、 前記スピンチヤツクを内包し、該スピンチヤツ
クと同軸上に回転する半球状のスピンカツプと、 前記スピンカツプの内周面にリンスを供給して
リンス液相を形成するリンス液供給ノズルとを有
することを特徴とするスピン式レジスト塗布装置
。[Claims for Utility Model Registration] A spin chuck for holding and rotating a substrate to be coated with resist; a hemispherical spin cup containing the spin chuck and rotating coaxially with the spin chuck; and an inner peripheral surface of the spin cup. 1. A spin-type resist coating apparatus comprising: a rinsing liquid supply nozzle that supplies rinsing liquid to form a rinsing liquid phase.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13617489U JPH0375530U (en) | 1989-11-24 | 1989-11-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13617489U JPH0375530U (en) | 1989-11-24 | 1989-11-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0375530U true JPH0375530U (en) | 1991-07-29 |
Family
ID=31683397
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13617489U Pending JPH0375530U (en) | 1989-11-24 | 1989-11-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0375530U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009214052A (en) * | 2008-03-11 | 2009-09-24 | Tokyo Electron Ltd | Coating device, coating method, and storage medium |
-
1989
- 1989-11-24 JP JP13617489U patent/JPH0375530U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009214052A (en) * | 2008-03-11 | 2009-09-24 | Tokyo Electron Ltd | Coating device, coating method, and storage medium |